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High energy storage density and efficiency of 0.5Ba(Zr0.2Ti0.8)O3–0.5(Ba0.7Ca0.3)TiO3 thin films on platinized sapphire substrates
Journal of Materials Chemistry A ( IF 10.7 ) Pub Date : 2024-12-10 , DOI: 10.1039/d4ta05675b
Sabi William Konsago, Katarina Žiberna, Aleksander Matavž, Barnik Mandal, Sebastjan Glinšek, Geoff L. Brennecka, Hana Uršič, Barbara Malič

Manganese-doped 0.5Ba(Zr0.2Ti0.8)O3–0.5(Ba0.7Ca0.3)TiO3 (BZT–BCT) ferroelectric thin films deposited on platinized sapphire substrates by chemical solution deposition and multistep-annealed at 850 °C, are investigated. The 100 nm and 340 nm thick films are crack-free and have columnar microstructures with average lateral grain sizes of 58 nm and 92 nm, respectively. The 340 nm thick films exhibit a relative permittivity of about 820 at 1 kHz and room temperature, about 60% higher than the thinner films, which is attributed to the dielectric grain size effect. The thinner films exhibit a larger coercive field and remanent polarization of about 110 kV cm−1 and 6 μC cm−2 respectively, at 1 MV cm−1 compared to 45 kV cm−1 and 4 μC cm−2 for the thicker films. The 340 nm thick films exhibit a maximum polarization of about 47 μC cm−2 at 3.5 MV cm−1 and slim polarization loops, resulting in high energy storage properties with 46 J cm−3 of recoverable energy storage density and 89% energy storage efficiency.

中文翻译:


在镀铂蓝宝石衬底上实现 0.5Ba(Zr0.2Ti0.8)O3–0.5(Ba0.7Ca0.3)TiO3 薄膜的高储能密度和效率



研究了掺锰的 0.5Ba(Zr0.2Ti0.8)O3–0.5(Ba0.7Ca0.3)TiO3 (BZT–BCT) 铁电薄膜通过化学溶液沉积沉积在镀铂蓝宝石衬底上,并在 850 °C 下进行多级退火。100 nm 和 340 nm 厚的薄膜无裂纹,具有柱状微观结构,平均横向晶粒尺寸分别为 58 nm 和 92 nm。340 nm 厚的薄膜在 1 kHz 和室温下的相对介电常数约为 820,比较薄的薄膜高约 60%,这归因于介电晶粒尺寸效应。较薄的薄膜在 1 MV cm-1 处表现出更大的矫顽力场和约 6 μC cm-2 的剩余极化,分别为约 110 kV cm-1 和 6 μC cm-2,而较厚的薄膜则为 45 kV cm-1 和 4 μC cm-2。340 nm 厚薄膜在 3.5 MV cm-1 处表现出约 47 μC cm-2 的最大极化和细长的极化环,从而具有高储能特性,具有 46 J cm-3 的可恢复储能密度和 89% 的储能效率。
更新日期:2024-12-10
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