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Corrigendum to ‘Mist CVD technology for gallium oxide deposition: A review’ [Mater. Today Phys. 49(2024) 101604]
Materials Today Physics ( IF 10.0 ) Pub Date : 2024-12-03 , DOI: 10.1016/j.mtphys.2024.101610
Suhao Yao, Yifan Yao, Maolin Zhang, Xueqiang Ji, Shan Li, Weihua Tang

The authors regret the missing expression of the copyright permission in Figure 5(a), (b); Figure 6(a), (b), (c); Figure 7(a), (b); figure 10(a), (b); Figure 11(a), (b); Figure 12(a), (b), (c), (d); Figure 13(a), (b), (c), (d); and Figure 15(a), (b), (c), (d). Figure 5 (b) and Figure 15 are from open access articles under CC BY 4.0. Figure 5(a) is reproduced by permission of IOP Publishing Ltd. Figure 6(a) and (b) are reproduced by permission of IOP Publishing Ltd. Figure 6(c) is reproduced by permission of IOP Publishing Ltd. Figure 7(a) is reproduced by permission of IOP Publishing Ltd. Figure 7(b) is reproduced by permission of IOP Publishing Ltd. Figure 10(a) and (b) are reproduced by permission of Cambridge University Press. Figure 11(a) and (b) are reproduced by permission of IOP Publishing Ltd. Figure 12(a), (b), (c), and (d) are reproduced by permission of AIP Publishing. Figure 13(a), (b), (c), and (d) are reproduced by permission of IOP Publishing Ltd. Therefore, their caption was ccorrected as followings.

中文翻译:


“用于氧化镓沉积的油雾 CVD 技术:综述”的勘误 [Mater.今日 Phys. 49(2024) 101604]



作者对图 5(a)、(b) 中缺少版权许可的表述感到遗憾;图 6(a)、(b)、(c);图 7(a)、(b);图 10(a)、(b);图 11(a)、(b);图 12(a)、(b)、(c)、(d);图 13(a)、(b)、(c)、(d);和图 15(a)、(b)、(c)、(d)。图 5 (b) 和图 15 来自 CC BY 4.0 下的开放获取文章。图 5(a) 经 IOP Publishing Ltd. 许可转载 图 6(a) 和 (b) 经 IOP Publishing Ltd. 许可转载 图 6(c) 经 IOP Publishing Ltd. 许可转载 图 7(a) 经 IOP Publishing Ltd. 许可转载 图 7(b) 经 IOP Publishing Ltd. 许可转载 图 10(a) 和 (b) 经剑桥大学出版社许可转载 图 11(a) 和 (b) 经剑桥大学出版社许可转载 图 11(a) 和 (b)经 IOP Publishing Ltd. 许可转载。图 12(a)、(b)、(c) 和 (d) 经 AIP Publishing 许可转载。图 13(a)、(b)、(c) 和 (d) 经 IOP Publishing Ltd. 许可复制。因此,他们的标题被更正如下。
更新日期:2024-12-03
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