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Growth of a hard, novel CVD multilayer coating: Ti(C,N) on (Ti,Al)N on TiN
International Journal of Refractory Metals & Hard Materials ( IF 4.2 ) Pub Date : 2024-11-17 , DOI: 10.1016/j.ijrmhm.2024.106966
Mohamed Ben Hassine, Hans-Olof Andrén, Anand H.S. Iyer, Olof Bäcke, Dirk Stiens, Wiebke Janssen, Johannes Kümmel, Mats Halvarsson

A novel chemical vapor deposition (CVD) multilayer coating intended for cutting applications was designed to achieve high wear and heat resistance during metal machining. The coating consists of three layers: a TiCN layer deposited on top of a TiAlN layer, which was grown on a layer of TiN that was deposited onto a cemented carbide substrate. The detailed microstructure of the coating was examined using a combination of electron microscope techniques. Two pyramidal surface morphologies and textures were observed, which could be related to the substrate roughness. Two growth modes were found: epitaxial growth of 〈211〉 oriented TiCN on <211> oriented TiAlN on <211> oriented TiN, leading to tilted TiCN pyramids at the coating surface; and epitaxial growth of 〈111〉 TiCN on <111> TiAlN on <111> TiN, leading to symmetrical TiCN pyramids at the coating surface.

中文翻译:


坚硬的新型 CVD 多层涂层的生长:Ti(C,N) 在 TiN 上的 (Ti,Al)N 上



一种用于切削应用的新型化学气相沉积 (CVD) 多层涂层被设计为在金属加工过程中实现高耐磨性和耐热性。涂层由三层组成:沉积在 TiAlN 层上的 TiCN 层,TiAlN 层生长在沉积在硬质合金基体上的 TiN 层上。使用电子显微镜技术的组合检查涂层的详细微观结构。观察到两种金字塔形的表面形态和纹理,这可能与基材粗糙度有关。发现了两种生长模式:〈211〉取向的TiCN在<211>取向的TiAlN上外延生长在<211>取向的TiN上,导致涂层表面的TiCN金字塔倾斜;以及 〈111〉 TiCN 在 <111> TiN 上 <111> TiN 上的外延生长,导致涂层表面出现对称的 TiCN 金字塔。
更新日期:2024-11-17
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