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Highly Efficient Flexible Antimony Halide Scintillator Films with In Situ Preparation for High‐Resolution X‐Ray Imaging
Laser & Photonics Reviews ( IF 9.8 ) Pub Date : 2024-11-11 , DOI: 10.1002/lpor.202401703 Haixing Meng, Ying Li, Ying Wang, Minqi Zhu, Jiawen Xiao, Guozhen Shen
Laser & Photonics Reviews ( IF 9.8 ) Pub Date : 2024-11-11 , DOI: 10.1002/lpor.202401703 Haixing Meng, Ying Li, Ying Wang, Minqi Zhu, Jiawen Xiao, Guozhen Shen
Flexible scintillators with high light yield, spatial resolution and low light scattering are ideal for X‐ray imaging application. However, conventional scintillators are always prepared by crystallization of functional layer, grinding and mixing with polymers, resulting in serious light scattering. Herein, an in situ fabrication strategy is proposed to prepare a low light scattering flexible scintillator film based on 0D antimony halide C38 H36 P2 SbCl5 (MTP2 SbCl5 ). The prepared scintillator film exhibits bright yellow emission with an outstanding photoluminescence quantum yield (PLQY) of 99.69%, and it demonstrates linear responsiveness to X‐ray dose, achieving an impressive light yield of 39800 photons MeV−1 and a low detection limitation of 78.4 nGyair s−1 . The scintillator film possesses strong radiation hardness and stability. In addition, low light scattering greatly inhibits optical crosstalk during X‐ray detection, effectively improving the spatial resolution of MTP2 SbCl5 film from 4.5 to 10.2 lp mm−1 . On account of the simple preparation method and high performance, this work provides guidance for the preparation of high‐efficiency, large‐area, low‐scattering and high‐resolution flexible scintillator in the future.
中文翻译:
用于高分辨率 X 射线成像的高效柔性卤化锑闪烁体薄膜与原位制备
具有高光产率、空间分辨率和低光散射的柔性闪烁体是 X 射线成像应用的理想选择。然而,传统的闪烁体总是通过功能层结晶、研磨并与聚合物混合来制备的,从而导致严重的光散射。在此,提出了一种基于零维卤化锑 C38H36P2SbCl5 (MTP2SbCl5) 的原位制备制备低光散射柔性闪烁体薄膜的原位制备策略。制备的闪烁体薄膜表现出亮黄色发射,具有出色的光致发光量子产率 (PLQY) 为 99.69%,并且对 X 射线剂量表现出线性响应性,实现了令人印象深刻的 39800 光子 MeV-1 光产率和 78.4 nGyair s-1 的低检测限。闪烁体薄膜具有很强的辐射硬度和稳定性。此外,低光散射极大地抑制了 X 射线检测过程中的光学串扰,有效地将 MTP2SbCl5 薄膜的空间分辨率从 4.5 lp mm-1 提高到 10.2 lp mm-1。由于制备方法简单、性能高,该工作为未来高效、大面积、低散射、高分辨率柔性闪烁体的制备提供了指导。
更新日期:2024-11-11
中文翻译:
用于高分辨率 X 射线成像的高效柔性卤化锑闪烁体薄膜与原位制备
具有高光产率、空间分辨率和低光散射的柔性闪烁体是 X 射线成像应用的理想选择。然而,传统的闪烁体总是通过功能层结晶、研磨并与聚合物混合来制备的,从而导致严重的光散射。在此,提出了一种基于零维卤化锑 C38H36P2SbCl5 (MTP2SbCl5) 的原位制备制备低光散射柔性闪烁体薄膜的原位制备策略。制备的闪烁体薄膜表现出亮黄色发射,具有出色的光致发光量子产率 (PLQY) 为 99.69%,并且对 X 射线剂量表现出线性响应性,实现了令人印象深刻的 39800 光子 MeV-1 光产率和 78.4 nGyair s-1 的低检测限。闪烁体薄膜具有很强的辐射硬度和稳定性。此外,低光散射极大地抑制了 X 射线检测过程中的光学串扰,有效地将 MTP2SbCl5 薄膜的空间分辨率从 4.5 lp mm-1 提高到 10.2 lp mm-1。由于制备方法简单、性能高,该工作为未来高效、大面积、低散射、高分辨率柔性闪烁体的制备提供了指导。