High refractive index dielectric materials like silicon rich nitride (SRN) are critical for constructing advanced dielectric metasurfaces but are limited by transparency and complementary metal oxide semiconductor (CMOS) process compatibility. SRN’s refractive index can be adjusted by varying the silicon to nitride ratio, although this increases absorption, particularly in the blue spectrum. Dielectric metasurfaces, which utilize the material’s high dielectric constant and nano-resonator geometry, experience loss amplification due to resonance, affecting light reflection, light transmission, and quality factor. This study explores the impact of varying the silicon ratio on structural color applications in metasurfaces, using metrics such as gamut coverage, saturation, and reflection amplitude. We found that a higher SRN ratio enhances these metrics, making it ideal for producing vivid structural colors. Our results show that SRN can produce a color spectrum covering up to 166 % of the sRGB space and a resolution of 38,000 dots per inch. Fabricated samples vividly displayed a parrot, a flower, and a rainbow, illustrating SRN’s potential for high-resolution applications. We also show that SRN can provide a better CIE diagram coverage than other popular metasurfaces materials. These findings highlight the advantages of SRN for photonic devices, suggesting pathways for further material and application development.

中文翻译：

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富硅氮化物：可控结构颜色的平台


富氮化硅 （SRN） 等高折射率介电材料对于构建先进的介电超表面至关重要，但受到透明度和互补金属氧化物半导体 （CMOS） 工艺兼容性的限制。SRN 的折射率可以通过改变硅氮化物比来调节，尽管这会增加吸收，尤其是在蓝色光谱中。介电超表面利用材料的高介电常数和纳米谐振器几何形状，由于共振而经历损耗放大，影响光反射、光传输和品质因数。本研究使用色域覆盖率、饱和度和反射幅度等指标探讨了改变硅比例对超表面结构颜色应用的影响。我们发现，较高的 SRN 比率可以增强这些指标，使其成为产生鲜艳结构色的理想选择。我们的结果表明，SRN 可以产生覆盖高达 166% 的 sRGB 空间的色谱，分辨率为每英寸 38,000 个点。制造的样品生动地展示了一只鹦鹉、一朵花和一道彩虹，说明了 SRN 在高分辨率应用方面的潜力。我们还表明，与其他流行的超表面材料相比，SRN 可以提供更好的 CIE 图覆盖率。这些发现突出了 SRN 在光子器件中的优势，为进一步的材料和应用开发提供了途径。