Metasurfaces, consisting of arrays of subwavelength structures, are lightweight and compact while being capable of implementing the functions of traditional bulky optical components. Furthermore, they have the potential to significantly improve complex optical systems in terms of space and cost, as they can simultaneously implement multiple functions. The wafer-scale mass production method based on the CMOS (complementary metal oxide semiconductor) process plays a crucial role in the modern semiconductor industry. This approach can also be applied to the production of metasurfaces, thereby accelerating the entry of metasurfaces into industrial applications. In this study, we demonstrated the mass production of large-area meta-axicons with a diameter of 2 mm on an 8-inch wafer using DUV (Deep Ultraviolet) photolithography. The proposed meta-axicon designed here is based on PB (Pancharatnam–Berry) phase and is engineered to simultaneously modulate the phase and polarization of light. In practice, the fabricated meta-axicon generated a circularly polarized Bessel beam with a depth of focus (DoF) of approximately 2.3 mm in the vicinity of 980 nm. We anticipate that the mass production of large-area meta-axicons on this CMOS platform can offer various advantages in optical communication, laser drilling, optical trapping, and tweezing applications.

中文翻译：

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在 CMOS 平台上大规模制备具有圆极化的超锥透镜


超表面由亚波长结构阵列组成，重量轻、结构紧凑，同时能够实现传统笨重光学元件的功能。此外，它们有可能在空间和成本方面显著改善复杂的光学系统，因为它们可以同时实现多种功能。基于 CMOS（互补金属氧化物半导体）工艺的晶圆级大规模生产方法在现代半导体工业中发挥着至关重要的作用。这种方法也可以应用于超表面的生产，从而加速超表面进入工业应用。在这项研究中，我们展示了使用 DUV（深紫外）光刻技术在 8 英寸晶圆上大规模生产直径为 2 mm 的大面积超锥透镜。这里设计的 meta-axicon 基于 PB （Pancharatnam-Berry） 相位，旨在同时调制光的相位和偏振。在实践中，制造的超锥透镜在 980 nm 附近产生了焦深 （DoF） 约为 2.3 mm 的圆偏振贝塞尔光束。我们预计，在这个 CMOS 平台上大规模生产大面积元锥透镜可以在光通信、激光钻孔、光捕获和镊子应用中提供各种优势。