Direct Synthesis of Perovskite Quantum Dot Photoresist for Direct Photolithography,Angewandte Chemie International Edition

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Direct Synthesis of Perovskite Quantum Dot Photoresist for Direct Photolithography
Angewandte Chemie International Edition ( IF 16.1 ) Pub Date : 2024-09-17 , DOI: 10.1002/anie.202413741
Gaoling Yang ₁ , Xiaochen Zhou ₂ , Zhiyuan Gao ₃ , Jianbing Shi ₂ , Tianhe Li ₃ , Shunsheng Wei ₂ , Peng Huang ₂ , Pingping Zhang ₂

Affiliation

A simple strategy is proposed for the direct synthesis of perovskite quantum dots (PQDs) photoresist, where the isobornyl acrylate (IBOA) acts as both the solution for the synthesis and dispersion of PQDs and the monomer resin for PQDs photoresist. The application of the PQDs photoresist in direct photolithography is confirmed.

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