当前位置：
X-MOL 学术
›
Ind. Eng. Chem. Res.
›
论文详情
Our official English website, www.x-mol.net, welcomes your
feedback! (Note: you will need to create a separate account there.)
Highly Efficient Adsorption of Organic Impurities in Industrial-Grade H2O2 Using π–π Interaction
Industrial & Engineering Chemistry Research ( IF 3.8 ) Pub Date : 2024-09-12 , DOI: 10.1021/acs.iecr.4c02101 Tong Wang 1, 2 , Xue Dang 2 , Yulin Wang 1 , Jian Zhang 1 , Yuechao Wu 1 , Huiming Zeng 1 , Hai-jie Ben 1 , Jianguang Li 1 , Feng Lin 1 , Kang Shao 2 , Liang Lv 1
Industrial & Engineering Chemistry Research ( IF 3.8 ) Pub Date : 2024-09-12 , DOI: 10.1021/acs.iecr.4c02101 Tong Wang 1, 2 , Xue Dang 2 , Yulin Wang 1 , Jian Zhang 1 , Yuechao Wu 1 , Huiming Zeng 1 , Hai-jie Ben 1 , Jianguang Li 1 , Feng Lin 1 , Kang Shao 2 , Liang Lv 1
Affiliation
|
Electronic-grade H2O2 with few impurities is crucial for the preparation of semiconductor chips. The organic impurities in H2O2 produced by the anthraquinone method are difficult to completely remove. Herein, KOH-modified activated carbon (KAC) is prepared to promote the adsorption of organic impurities through copious π–π interaction. The results indicate that KAC-800 showed an excellent adsorption capacity of organic impurities. The removal rates of organic impurities in 35 wt % H2O2 and 50 wt % H2O2 can reach ∼100% and 98.2%, respectively. Besides, the adsorption process of KAC-800 was based on the pseudo-second-order adsorption isotherm and Freundlich kinetic model. Therefore, KAC-800 is an effective and suitable adsorbent for eliminating organic impurities in H2O2.
中文翻译：
利用 π-π 相互作用高效吸附工业级 H2O2 中的有机杂质
杂质含量少的电子级H 2 O 2对于半导体芯片的制备至关重要。蒽醌法产生的H 2 O 2中的有机杂质难以完全去除。在此，制备了 KOH 改性活性炭（KAC），通过大量的 π-π 相互作用促进有机杂质的吸附。结果表明KAC-800对有机杂质表现出优异的吸附能力。 35 wt% H 2 O 2和50 wt% H 2 O 2中有机杂质的去除率分别可达~100%和98.2%。此外，KAC-800的吸附过程基于准二级吸附等温线和Freundlich动力学模型。因此，KAC-800是一种有效且合适的去除H 2 O 2中有机杂质的吸附剂。
更新日期：2024-09-12
中文翻译：
利用 π-π 相互作用高效吸附工业级 H2O2 中的有机杂质
杂质含量少的电子级H 2 O 2对于半导体芯片的制备至关重要。蒽醌法产生的H 2 O 2中的有机杂质难以完全去除。在此，制备了 KOH 改性活性炭（KAC），通过大量的 π-π 相互作用促进有机杂质的吸附。结果表明KAC-800对有机杂质表现出优异的吸附能力。 35 wt% H 2 O 2和50 wt% H 2 O 2中有机杂质的去除率分别可达~100%和98.2%。此外，KAC-800的吸附过程基于准二级吸附等温线和Freundlich动力学模型。因此，KAC-800是一种有效且合适的去除H 2 O 2中有机杂质的吸附剂。
京公网安备 11010802027423号