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Full-scale evaluation of FFU configurations in an optical cleanroom injection molding for improving thermal performance and contaminant removal
Case Studies in Thermal Engineering ( IF 6.4 ) Pub Date : 2024-09-02 , DOI: 10.1016/j.csite.2024.105076 Indra Permana , Alya Penta Agharid , Nitesh Singh , Fujen Wang
Case Studies in Thermal Engineering ( IF 6.4 ) Pub Date : 2024-09-02 , DOI: 10.1016/j.csite.2024.105076 Indra Permana , Alya Penta Agharid , Nitesh Singh , Fujen Wang
Cleanrooms are critical in the semiconductor industry, particularly for optical fabrication, where even minor contamination can compromise product quality. Effective airflow and uniform airflow distribution help to prevent contaminant accumulation, mitigate temperature variations, and avoid cross-contamination, which is crucial for achieving high-quality results and compliance with industry standards. This study introduces a novel approach to optimizing Fan Filter Unit (FFU) configurations to enhance thermal performance and contaminant removal in cleanroom settings. Integrating field measurements with advanced Computational Fluid Dynamics (CFD) simulations to comprehensively evaluate four distinct FFU designs, from dispersed to centralized configurations, focused on their impact on airflow dynamics, temperature uniformity, and particle concentration. The study identifies a significant advancement in FFU configuration by demonstrating that centralized arrangements (Designs 2 and 4) substantially improve cleanroom performance. Design 4 emerged as the most effective, showcasing a marked improvement in airflow circulation, a 12 % reduction in temperature variation, and a 15 % decrease in particle concentration compared to conventional designs. This achievement underscores the novel contribution of this study in optimizing FFU configurations to enhance both thermal performance and contaminant control. These findings not only advance the theoretical understanding of FFU design but also provide practical insights for improving cleanroom environments. The study offers a significant step forward in developing efficient cleanroom designs, contributing valuable guidelines for achieving good environmental control in sensitive manufacturing processes.
中文翻译:
对光学洁净室注塑中的 FFU 配置进行全面评估,以提高热性能和污染物去除率
洁净室在半导体行业中至关重要,特别是对于光学制造而言,即使是轻微的污染也会影响产品质量。有效的气流和均匀的气流分布有助于防止污染物积累、减轻温度变化并避免交叉污染,这对于实现高质量结果和遵守行业标准至关重要。本研究介绍了一种优化风扇过滤器单元 (FFU) 配置的新颖方法,以增强洁净室环境中的热性能和污染物去除能力。将现场测量与先进的计算流体动力学 (CFD) 模拟相结合,全面评估四种不同的 FFU 设计(从分散式配置到集中式配置),重点关注它们对气流动力学、温度均匀性和颗粒浓度的影响。该研究通过证明集中式布置(设计 2 和 4)可显着提高洁净室性能,确定了 FFU 配置的重大进步。设计 4 是最有效的,与传统设计相比,气流循环显着改善,温度变化减少 12%,颗粒浓度减少 15%。这一成就强调了这项研究在优化 FFU 配置以增强热性能和污染物控制方面的新贡献。这些发现不仅增进了对 FFU 设计的理论理解,还为改善洁净室环境提供了实践见解。该研究在开发高效洁净室设计方面向前迈出了重要一步,为在敏感制造过程中实现良好的环境控制提供了宝贵的指导方针。
更新日期:2024-09-02
中文翻译:
对光学洁净室注塑中的 FFU 配置进行全面评估,以提高热性能和污染物去除率
洁净室在半导体行业中至关重要,特别是对于光学制造而言,即使是轻微的污染也会影响产品质量。有效的气流和均匀的气流分布有助于防止污染物积累、减轻温度变化并避免交叉污染,这对于实现高质量结果和遵守行业标准至关重要。本研究介绍了一种优化风扇过滤器单元 (FFU) 配置的新颖方法,以增强洁净室环境中的热性能和污染物去除能力。将现场测量与先进的计算流体动力学 (CFD) 模拟相结合,全面评估四种不同的 FFU 设计(从分散式配置到集中式配置),重点关注它们对气流动力学、温度均匀性和颗粒浓度的影响。该研究通过证明集中式布置(设计 2 和 4)可显着提高洁净室性能,确定了 FFU 配置的重大进步。设计 4 是最有效的,与传统设计相比,气流循环显着改善,温度变化减少 12%,颗粒浓度减少 15%。这一成就强调了这项研究在优化 FFU 配置以增强热性能和污染物控制方面的新贡献。这些发现不仅增进了对 FFU 设计的理论理解,还为改善洁净室环境提供了实践见解。该研究在开发高效洁净室设计方面向前迈出了重要一步,为在敏感制造过程中实现良好的环境控制提供了宝贵的指导方针。