Eight kinds of patterned discharges are obtained by changing the discharge parameters in a dielectric barrier discharge with modulated gas gaps, which are applicable to materials patterned treatment. A square superlattice pattern consisting of two dot sublattices and one ring sublattice is studied and used to treat a PI film. The formation mechanism is studied by intensified charge coupled device. The spatial distribution of the plasma parameters is measured using optical emission spectra. The gas temperatures as well as the electron densities of the three sublattices are significantly different from each other. The physical and chemical properties of the treated film are measured using a surface profiler, x-ray photoelectron spectroscopy, and scanning electron microscope. The transmissivity, wettability, and etching depth of the treated PI film demonstrate square superlattice pattern distribution, which verifies the predictions based on plasma parameter measurements. The dielectric barrier discharge device reported here is also applicable to materials' patterned growth.

中文翻译：

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用于调制气隙介电势垒放电中材料局部处理的图案化放电


在具有调制气隙的介电势垒放电中改变放电参数，得到八种图案化放电，适用于材料图案化处理。研究了由两个点子晶格和一个环形子晶格组成的方形超晶格图案，并用于处理 PI 膜。通过增强型电荷耦合器件研究了其形成机制。等离子体参数的空间分布是使用光学发射光谱测量的。三个亚晶格的气体温度和电子密度彼此显着不同。使用表面轮廓仪、X 射线光电子能谱和扫描电子显微镜测量处理过的薄膜的物理和化学性质。处理后的 PI 薄膜的透射率、润湿性和蚀刻深度显示出方形超晶格图案分布，这验证了基于等离子体参数测量的预测。这里报道的介电势垒放电装置也适用于材料的图案生长。