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Thermal stability and phase transformation of α-, κ(ε)-, and γ-Ga2O3 films under different ambient conditions
Applied Physics Letters ( IF 3.5 ) Pub Date : 2024-08-29 , DOI: 10.1063/5.0214500
Jingyu Tang 1 , Kunyao Jiang 1 , Po-Sen Tseng 1 , Rachel C. Kurchin 1 , Lisa M. Porter 1 , Robert F. Davis 1, 2
Affiliation  

Phase transitions in metastable α-, κ(ε)-, and γ-Ga2O3 films to thermodynamically stable β-Ga2O3 during annealing in air, N2, and vacuum have been systematically investigated via in situ high-temperature x-ray diffraction (HT-XRD) and scanning electron microscopy (SEM). These respective polymorphs exhibited thermal stability to ∼471–525 °C, ∼773–825 °C, and ∼490–575 °C before transforming into β-Ga2O3, across all tested ambient conditions. Particular crystallographic orientation relationships were observed before and after the phase transitions, i.e., (0001) α-Ga2O3 → (2¯01) β-Ga2O3, (001) κ(ε)-Ga2O3 → (310) and (2¯01) β-Ga2O3, and (100) γ-Ga2O3 → (100) β-Ga2O3. The phase transition of α-Ga2O3 to β-Ga2O3 resulted in catastrophic damage to the film and upheaval of the surface. The respective primary and possibly secondary causes of this damage are the +8.6% volume expansion and the dual displacive and reconstructive transformations that occur during this transition. The κ(ε)- and γ-Ga2O3 films converted to β-Ga2O3 via singular reconstructive transformations with small changes in volume and unchanged surface microstructures.

中文翻译:


不同环境条件下 α-、κ(ε)- 和 γ-Ga2O3 薄膜的热稳定性和相变



通过原位高温 X 射线衍射 (HT-XRD) 和扫描电子显微镜 (SEM) 系统研究了亚稳态 α-、κ(ε) 和 γ-Ga2O3 薄膜在空气、N2 和真空退火过程中向热力学稳定的 β-Ga2O3 薄膜的相变。在所有测试环境条件下,这些多晶型物在转化为 β-Ga2O3 之前表现出 ∼471-525 °C、∼773-825 °C 和 ∼490-575 °C 的热稳定性。在相变前后观察到特定的晶体取向关系,即 (0001) α-Ga2O3 → (2 ̄01) β-Ga2O3,(001) κ(ε)-Ga2O3 → (310) 和 (2 ̄01) β-Ga2O3,以及 (100) γ-Ga2O3 → (100) β-Ga2O3。α-Ga2O3 到 β-Ga2O3 的相变导致薄膜的灾难性损伤和表面的隆起。这种损伤的主要和可能的次要原因是 +8.6% 的体积膨胀以及在此过渡期间发生的双重位移和重建转变。κ(ε) 和 γ-Ga2O3 薄膜通过体积变化很小且表面微观结构不变的奇异重建转变转化为 β-Ga2O3。
更新日期:2024-08-29
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