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Dual-control of incubation effect for efficiently fabricating surface structures in fused silica
Nanophotonics ( IF 6.5 ) Pub Date : 2024-08-27 , DOI: 10.1515/nanoph-2024-0324 Zhi Wang 1 , Zhikun Xiang 1 , Xiaowei Li 1 , Mengnan Wu 2 , Peng Yi 1 , Chao Zhang 1 , Yihao Yan 1 , Xibiao Li 1 , Xiangyu Zhang 1 , Andong Wang 1 , Lingling Huang 3
Nanophotonics ( IF 6.5 ) Pub Date : 2024-08-27 , DOI: 10.1515/nanoph-2024-0324 Zhi Wang 1 , Zhikun Xiang 1 , Xiaowei Li 1 , Mengnan Wu 2 , Peng Yi 1 , Chao Zhang 1 , Yihao Yan 1 , Xibiao Li 1 , Xiangyu Zhang 1 , Andong Wang 1 , Lingling Huang 3
Affiliation
Fused silica with surface structures has potential applications in microfluidic, aerospace and other fields. To fabricate structures with high dimensional accuracy and surface quality is of paramount importance. However, it is indeed a challenge to strike a balance between accuracy and efficiency at the same time. Here, a temporally shaped femtosecond laser Bessel-beam-assisted etching method with dual-control of incubation effect is proposed to achieve this balance. Instead of layer-by-layer ablation continuously with Gaussian pulses, silica is modified discretely by double pulse Bessel beam with one single layer. During the modification process, incubation effect is dual-controlled in single shot process and spatial scanning process to generate even modified region efficiently. Then, the modified region is etched to form designed structures such as microholes, grooves, etc. The proposed method exhibits high efficiency for fabrication of surface structures in fused silica.
中文翻译:
双重控制孵育效应,可在熔融石英中高效制造表面结构
具有表面结构的熔融石英在微流控、航空航天等领域具有潜在的应用前景。制造具有高尺寸精度和表面质量的结构至关重要。然而,同时在准确性和效率之间取得平衡确实是一个挑战。在这里,提出了一种具有双重孵育效应控制的时间形状飞秒激光贝塞尔束辅助刻蚀方法来实现这种平衡。二氧化硅不是用高斯脉冲连续逐层烧蚀,而是通过具有单层的双脉冲贝塞尔束进行离散改性。在修饰过程中,孵化效应在单发过程和空间扫描过程中双重控制,以高效生成均匀的修饰区域。然后,蚀刻改性区域以形成设计结构,例如微孔、凹槽等。所提出的方法在熔融石英中制备表面结构方面表现出很高的效率。
更新日期:2024-08-27
中文翻译:

双重控制孵育效应,可在熔融石英中高效制造表面结构
具有表面结构的熔融石英在微流控、航空航天等领域具有潜在的应用前景。制造具有高尺寸精度和表面质量的结构至关重要。然而,同时在准确性和效率之间取得平衡确实是一个挑战。在这里,提出了一种具有双重孵育效应控制的时间形状飞秒激光贝塞尔束辅助刻蚀方法来实现这种平衡。二氧化硅不是用高斯脉冲连续逐层烧蚀,而是通过具有单层的双脉冲贝塞尔束进行离散改性。在修饰过程中,孵化效应在单发过程和空间扫描过程中双重控制,以高效生成均匀的修饰区域。然后,蚀刻改性区域以形成设计结构,例如微孔、凹槽等。所提出的方法在熔融石英中制备表面结构方面表现出很高的效率。