This study aims to develop a strategy for the fabrication of multilayer nanopatterns through sequential self-assembly of lamella-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymer (BCP) from solvent annealing. By simply tuning the solvent selectivity, a variety of self-assembled BCP thin-film morphologies, including hexagonal perforated lamellae (HPL), parallel cylinders, and spheres, can be obtained from single-composition PS-b-PDMS. By taking advantage of reactive ion etching (RIE), topographic SiO₂ monoliths with well-ordered arrays of hexagonally packed holes, parallel lines, and hexagonally packed dots can be formed. Subsequently, hole-on-dot and line-on-hole hierarchical textures can be created through a layer-by-layer process with RIE treatment as evidenced experimentally and confirmed theoretically. The results demonstrated the feasibility of creating three-dimensional (3D) nanopatterning from the sequential self-assembly of single-composition PS-b-PDMS via solvent annealing, providing an appealing process for nano-MEMS manufacturing based on BCP lithography.

中文翻译：

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通过溶剂退火进行 3D 纳米图案化的聚苯乙烯嵌段聚二甲基硅氧烷的顺序自组装


本研究旨在开发一种通过溶剂退火连续自组装层状聚苯乙烯-嵌段-聚二甲基硅氧烷（PS -b -PDMS）嵌段共聚物（BCP）来制造多层纳米图案的策略。通过简单地调节溶剂选择性，可以从单一组合物 PS- b -PDMS 获得各种自组装 BCP 薄膜形态，包括六角形穿孔片层 (HPL)、平行圆柱体和球体。通过利用反应离子蚀刻（RIE），可以形成具有六边形填充孔、平行线和六边形填充点的有序阵列的形貌SiO ₂整料。随后，通过 RIE 处理的逐层工艺可以创建点上孔和孔上线分层纹理，这已得到实验证明和理论证实。结果证明了通过溶剂退火顺序自组装单一成分 PS- b -PDMS 创建三维 (3D) 纳米图案的可行性，为基于 BCP 光刻的纳米 MEMS 制造提供了一种有吸引力的工艺。