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Does an untreated peri‐implant dehiscence defect affect the progression of peri‐implantitis?: A preclinical in vivo experimental study
Clinical Oral Implants Research ( IF 4.8 ) Pub Date : 2024-07-01 , DOI: 10.1111/clr.14324
Young Woo Song 1 , Jin-Young Park 2 , Ji-Yeong Na 2 , Yoon-Hee Kwon 2 , Jae-Kook Cha 2 , Ui-Won Jung 2 , Daniel S Thoma 2, 3 , Ronald E Jung 3
Affiliation  

ObjectiveTo investigate the early impact of plaque accumulation in a buccal dehiscence defect on peri‐implant marginal bone resorption.Materials and MethodsIn six male Mongrel dogs, four dental implants were placed in the posterior maxilla on both sides (two implants per side). Based on the group allocation, each implant was randomly assigned to one of the following four groups to decide whether buccal dehiscence defect was prepared and whether silk ligation was applied at 8 weeks post‐implant placement for peri‐implantitis induction: UC (no defect without ligation); UD (defect without ligation); LC (no defect with ligation); and LD (defect with ligation) groups. Eight weeks after disease induction, the outcomes from radiographic and histologic analyses were statistically analyzed (p < .05).ResultsBased on radiographs, the exposed area of implant threads was smallest in group UC (p < .0083). Based on histology, both the distances from the implant platform to the first bone‐to‐implant contact point and to the bone crest were significantly longer in the LD group (p < .0083). In the UD group, some spontaneous bone fill occurred from the base of the defect at 8 weeks after implant placement. The apical extension of inflammatory cell infiltrate was significantly more prominent in the LD and LC groups compared to the UC group (p < .0083).ConclusionPlaque accumulated on the exposed implant surface had a negative impact on maintaining the peri‐implant marginal bone level, especially when there was a dehiscence defect around the implant.

中文翻译:


未经治疗的种植体周围裂开缺损会影响种植体周围炎的进展吗?: 一项临床前体内实验研究



目的探讨颊裂开缺损中斑块积聚对种植体周围边缘骨吸收的早期影响。材料和方法在 6 只雄性犬中,将 4 个种植牙放置在两侧的上颌后牙中(每侧 2 个种植体)。根据组分配,将每个种植体随机分配到以下四组中的一组,以决定是否准备了颊裂缺损,以及是否在种植体植入后 8 周应用蚕丝结扎以诱导种植体周围炎:UC(无结扎无缺损);UD (无结扎的缺损);LC (连接无缺陷);和 LD (结扎缺陷) 组。引病后 8 周,对放射学和组织学分析的结果进行统计分析 (p < .05)。结果根据 X 光片,UC 组种植体螺纹的暴露面积最小 (p < .0083)。根据组织学,LD 组从种植体平台到第一个骨与种植体接触点和到骨嵴的距离都显着更长 (p < .0083)。在 UD 组中,种植体植入后 8 周从缺损底部发生一些自发性骨填充。与 UC 组相比,LD 和 LC 组炎性细胞浸润的顶端延伸显着更突出 (p < .0083)。结论裸露种植体表面积累的斑块对维持种植体周围边缘骨水平有负面影响,尤其是当种植体周围存在裂开缺损时。
更新日期:2024-07-01
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