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Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography
ACS Applied Materials & Interfaces ( IF 8.3 ) Pub Date : 2024-06-28 , DOI: 10.1021/acsami.4c07100
Xavier Baami González 1 , Jimmy Duc Tran 1 , Duncan S. Sutherland 1
Affiliation  

Nanomaterials shaped as rings are interesting nanostructures with control of the materials properties at the nanoscale. Nanoring plasmonic resonators provide tunable optical resonances in the near-infrared with application in sensing. Fabrication of nanorings can be carried out via top-down approaches based on electron beam lithography with high control of the ring size parameters but at high cost. Alternatively, fabrication via self-assembly approaches has a higher speed/lower cost but at the cost of control of ring parameters. Current colloidal lithography approaches can provide nanoring fabrication over large areas but only of specific materials and a select set of rings (large ring diameters or small rings with ultrathin walls). We extend Hole-mask Colloidal Lithography to use ring shaped holes, allow the deposition of arbitrary materials, and allow the independent tuning of ring-wall thickness over a large range of values. We present a generic approach for the fabrication of nanorings formed from a range of materials including low cost (e.g., Cu, Al) and nonplasmonic (e.g., W) materials and with control of ring wall thickness and diameter allowing tuning of ring parameters and materials for applications in nanooptics and beyond.

中文翻译:


孔掩模胶体光刻辅助的多功能纳米环制造



环形纳米材料是有趣的纳米结构,可以在纳米尺度上控制材料特性。纳米环等离子体谐振器在近红外区域提供可调谐光学谐振,并应用于传感。纳米环的制造可以通过基于电子束光刻的自上而下的方法来进行,对环尺寸参数进行高度控制,但成本很高。或者,通过自组装方法制造具有更高的速度/更低的成本,但以控制环参数为代价。目前的胶体光刻方法可以在大面积上提供纳米环制造,但仅限于特定材料和一组选定的环(大环直径或具有超薄壁的小环)。我们将孔掩模胶体光刻扩展到使用环形孔,允许沉积任意材料,并允许在大范围值内独立调整环壁厚度。我们提出了一种通用方法,用于制造由一系列材料形成的纳米环,包括低成本(例如铜、铝)和非等离子体(例如钨)材料,并控制环壁厚度和直径,从而可以调整环参数和材料适用于纳米光学及其他领域的应用。
更新日期:2024-06-30
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