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Regulating the stability of boron oxide active species under high-temperature and humid conditions by engineering pore walls
Chem Catalysis ( IF 11.5 ) Pub Date : 2024-06-17 , DOI: 10.1016/j.checat.2024.101028
Lei Cao , Wenda Bao , Yilan Jiang , Sheng Wen , Peng Xu , Guohui Zhong , Yifan Wu , Rongliang Shang , Fufei Cong , Yixiao Liu , Pengcheng Dai , Jin Xie

The loss of active centers is the key factor that limits the lifespan of catalysts. Supported boron oxide (B2O3/SiO2) catalysts, despite their high selectivity and productivity in oxidative dehydrogenation of propane (ODHP), suffer from rapid leaching of boron oxide species under harsh reaction conditions. In this study, we employed atomic layer deposition (ALD) to create stable and porous ALD-Al2O3 walls on 17B2O3/SiO2 catalysts. Through catalytic ODHP conducted under high-temperature and humid conditions, the mean leaching rate of boron oxide decreased from 0.57 to 0.10 wt % h−1, demonstrating an approximately 5.7-fold reduction. The porous ALD-Al2O3 walls, exhibiting sufficient thickness (>10 nm) and abundant micropores (∼1.7 nm), effectively confined the boron oxide. The presence of numerous hydroxyl groups within these narrow channels significantly strengthens the interaction between the boron oxide and the ALD-Al2O3 walls. This work introduces a novel approach to confine volatile catalytic active components under challenging operational circumstances.



中文翻译:


通过工程孔壁调节高温高湿条件下氧化硼活性物质的稳定性



活性中心的损失是限制催化剂寿命的关键因素。负载型氧化硼 (B 2 O 3 /SiO 2 ) 催化剂尽管在丙烷氧化脱氢 (ODHP) 中具有较高的选择性和生产率,但在恶劣的反应条件下浸出氧化硼物质。在这项研究中,我们采用原子层沉积 (ALD) 在 17B 2 O 3 O 3 壁。 /b6> /SiO 2 催化剂。通过在高温高湿条件下进行催化ODHP,氧化硼的平均浸出率从0.57 wt% h −1 降低至0.10 wt % h −1 ,减少了约5.7倍。多孔ALD-Al 2 O 3 壁具有足够的厚度(>10 nm)和丰富的微孔(∼1.7 nm),有效地限制了氧化硼。这些狭窄通道内大量羟基的存在显着增强了氧化硼和 ALD-Al 2 O 3 壁之间的相互作用。这项工作介绍了一种在具有挑战性的操作环境下限制挥发性催化活性成分的新方法。

更新日期:2024-06-17
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