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Ultrathin and Deformable Graphene Etch Mask for Fabrication of 3D Microstructures
ACS Nano ( IF 15.8 ) Pub Date : 2024-04-30 , DOI: 10.1021/acsnano.4c01279
Jiwoo Kim 1 , Donghoon Moon 1 , Hyunchul Kim 2 , Arend M van der Zande 2 , Gwan-Hyoung Lee 1
Affiliation  

Three-dimensional (3D) microfabrication techniques play a crucial role across various research fields. These techniques enable the creation of functional 3D structures on the microscale, unlocking possibilities for diverse applications. However, conventional fabrication methods have limits in producing complex 3D structures, which require numerous fabrication steps that increase the costs. Graphene is an atomically thin material known for its deformability and impermeability to small gases and molecules, including reactive gases like XeF2. These features make graphene a potential candidate as an etch mask for 3D microfabrication. Here, we report the fabrication of various 3D microstructures using graphene etch masks directly grown and patterned on a Si substrate. The patterned graphene deforms and wraps the etched structures, allowing for the fabrication of complicated 3D microstructures, such as mushroom-like and step-like microstructures. As a practical demonstration of the graphene etch mask, we fabricate an omniphobic surface of reentrant 3D structures on a Si substrate. Our work provides a method for fabricating complex 3D microstructures using a graphene etch mask, contributing to advancements in etching and fabrication processes.

中文翻译:


用于制造 3D 微结构的超薄可变形石墨烯蚀刻掩模



三维 (3D) 微加工技术在各个研究领域发挥着至关重要的作用。这些技术能够在微尺度上创建功能性 3D 结构,从而释放多种应用的可能性。然而,传统的制造方法在生产复杂的 3D 结构方面存在局限性,需要大量的制造步骤,从而增加了成本。石墨烯是一种原子薄材料,以其可变形性和对小气体和分子(包括 XeF 2等反应气体)的不渗透性而闻名。这些特性使石墨烯成为 3D 微加工蚀刻掩模的潜在候选者。在这里,我们报告了使用在 Si 基板上直接生长和图案化的石墨烯蚀刻掩模制造各种 3D 微结构。图案化的石墨烯变形并包裹蚀刻结构,从而可以制造复杂的 3D 微结构,例如蘑菇状和阶梯状微结构。作为石墨烯蚀刻掩模的实际演示,我们在 Si 基板上制造了可重入 3D 结构的全疏表面。我们的工作提供了一种使用石墨烯蚀刻掩模制造复杂 3D 微结构的方法,有助于蚀刻和制造工艺的进步。
更新日期:2024-04-30
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