The creation of well-defined surface nanostructures is important for a diverse set of applications such as cell adhesion, superhydrophobic coating, and lithography. In this study, we describe a robust bottom-up method for surface functionalization that involves surface-initiated reversible deactivation radical polymerization (RDRP) and the grafting of block copolymer nanoparticles to material surfaces via aqueous photoinduced polymerization-induced self-assembly (photo-PISA) at room temperature. Using silica nanoparticles as a model substrate, colloidal mesoscale hybrid assemblies with various morphologies were successfully prepared. The morphologies can be easily tuned by changing the lengths of macromolecular chain transfer agents and parameters of the silica nanoparticles. The surface-initiated photo-PISA approach can also be employed for other large-scale substrates such as silicon wafer. Taking advantage of mild reaction conditions of this method (room temperature, aqueous medium, and visible light), enzymatic deoxygenation was introduced to develop oxygen-tolerant surface-initiated photo-PISA that can fabricate well-defined nanostructures on large-scale substrates under open-to-air conditions.

中文翻译：

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室温下通过水相光诱导聚合诱导自组装将嵌段共聚物纳米颗粒接枝到表面


创建明确的表面纳米结构对于细胞粘附、超疏水涂层和光刻等多种应用非常重要。在这项研究中，我们描述了一种稳健的自下而上的表面功能化方法，包括表面引发的可逆失活自由基聚合（RDRP）以及通过水性光诱导聚合诱导自组装（photo-PISA）将嵌段共聚物纳米颗粒接枝到材料表面。 ） 在室温下。使用二氧化硅纳米粒子作为模型基底，成功制备了具有各种形貌的胶体介观尺度杂化组件。通过改变大分子链转移剂的长度和二氧化硅纳米粒子的参数可以很容易地调节形态。表面引发光 PISA 方法也可用于其他大型基材，例如硅晶圆。利用该方法温和的反应条件（室温、水介质和可见光），引入酶促脱氧来开发耐氧的表面引发光-PISA，可以在开放条件下在大规模基底上制造清晰的纳米结构。 - 空气条件。