UV curing hybrid materials via the photo polymerization have significant significance for the lithography fields due to the high resolution. In this work, the UV-curable SiO₂ materials with chelating compound structure are synthesized by photosensitive Sol–Gel approach, which have a wide absorption band at 267 nm. With the UV light irradiation, the chelating compound structure decomposes and the solubility of the film in organic solvent decreases. Based on this premise, the presented material exhibits the ability to fabricating highly ordered SiO₂ microarrays on several substrates through UV photolithography. The SiO₂ micro arrays can be used to as templates to prepare noble metal micro-structures, which own wide potential application prospects in highly ordered SERS substrates with high activity and reproductivity for trace detection.

通过光聚合的紫外固化混合材料由于其高分辨率而对于光刻领域具有重要意义。本工作采用光敏Sol-Gel方法合成了具有螯合化合物结构的紫外光固化SiO ₂材料，该材料在267 nm处具有宽吸收带。随着紫外光照射，螯合化合物结构分解，膜在有机溶剂中的溶解度降低。基于这个前提，所提出的材料表现出通过紫外光刻在多种基底上制造高度有序的SiO ₂微阵列的能力。 SiO ₂微阵列可以作为模板制备贵金属微结构，在痕量检测中具有高活性和重现性的高度有序SERS基底中具有广阔的潜在应用前景。