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Volatile and Thermally Stable Mid to Late Transition Metal Complexes Containing α-Imino Alkoxide Ligands, a New Strongly Reducing Coreagent, and Thermal Atomic Layer Deposition of Ni, Co, Fe, and Cr Metal Films
Journal of the American Chemical Society ( IF 14.4 ) Pub Date : 2013-08-16 , DOI: 10.1021/ja407014w
Lakmal C. Kalutarage 1 , Philip D. Martin 1 , Mary Jane Heeg 1 , Charles H. Winter 1
Affiliation  

Treatment of MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) with 2 equiv of α-imino alkoxide salts K(RR'COCNtBu) (R = Me, tBu; R' = iPr, tBu) afforded M(RR'COCNtBu)2 or [Mn(RR'COCNtBu)2]2 in 9-75% yields. These complexes combine volatility and high thermal stability and have useful atomic layer deposition (ALD) precursor properties. Solution reactions between Ni, Co, and Mn complexes showed that BH3(NHMe2) can reduce all to metal powders. ALD growth of Ni, Co, Fe, and Cr films is demonstrated. Mn film growth may be possible, but the films oxidize completely upon exposure to air.

中文翻译:

含有 α-亚氨基醇盐配体的挥发性和热稳定的中晚期过渡金属配合物,一种新型强还原助剂,以及 Ni、Co、Fe 和 Cr 金属膜的热原子层沉积

用 2 当量的 α-亚氨基醇盐 K(RR'COCNtBu) (R = Me, tBu; R' = iPr, tBu) 处理 MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) 得到 M( RR'COCNtBu)2 或 [Mn(RR'COCNtBu)2]2 的产率为 9-75%。这些复合物结合了挥发性和高热稳定性,并具有有用的原子层沉积 (ALD) 前体特性。Ni、Co 和 Mn 配合物之间的溶液反应表明 BH3(NHMe2) 可以将它们全部还原为金属粉末。展示了 Ni、Co、Fe 和 Cr 薄膜的 ALD 生长。Mn 薄膜生长可能是可能的,但薄膜在暴露于空气时会完全氧化。
更新日期:2013-08-16
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