Water purification from highly migratory and toxic As(III) is challenging but critically needed. Herein, a novel oxidation-sorption bifunctional UiO-66-Cl was fabricated by replacing some organic linkers in UiO-66 with oxidation groups (N-chlorosulfonamide) and applied for deep purification of As(III) contamination. In UiO-66-Cl, oxidation groups are closely distributed around the sorption sites achieving rapid capture of As(III) after oxidation. UiO-66-Cl_1:5 achieved decontamination of As(III) level (1035 μg/L) to meet the drinking standard level (less than 10 μg/L) in just 10 min. Similar removal efficiencies can be achieved across a very broad pH range (3–10), which is superior to most other sorbents. Moreover, aqueous disturbances, such as the coexistence of common anions and natural organic matter, hardly affected As(III) removal by UiO-66-Cl_1:5. UiO-66-Cl_1:5 could still perform reliably in natural water matrixes. During the removal process, the majority of As(III) was oxidized to As(V) and captured through an inner-sphere complexing mechanism. The exhausted UiO-66-Cl_1:5 could be effectively regenerated by treatment with NaOH solution and NaClO solution. The work provided a versatile MOFs-based sorbent for reliable and simple remediation of As(III) contamination.

从高度迁移和有毒的 As(III) 中净化水是一项挑战，但也是迫切需要的。在此，通过用氧化基团（N-氯磺酰胺）取代UiO-66中的一些有机连接基，制备了一种新型氧化吸附双功能UiO-66-Cl，并将其用于As（III）污染的深度净化。在UiO-66-Cl中，氧化基团紧密分布在吸附位点周围，实现氧化后As(III)的快速捕获。UiO-66-Cl _1:5仅需10分钟即可达到As(III)水平（1035 μg/L）的净化，达到饮用标准水平（小于10 μg/L）。在非常宽的 pH 范围 (3-10) 内可以实现类似的去除效率，这优于大多数其他吸附剂。_{此外，常见阴离子和天然有机物共存等水体干扰几乎不影响UiO-66-Cl 1:5}去除As(III) 。UiO-66-Cl _1:5在天然水基质中仍能可靠地发挥作用。在去除过程中，大部分 As(III) 被氧化为 As(V)，并通过内球络合机制捕获。废UiO-66-Cl _1:5经NaOH溶液和NaClO溶液处理可有效再生。这项工作提供了一种基于 MOF 的多功能吸附剂，用于可靠且简单地修复 As(III) 污染。