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Atomic/molecular layer deposition of europium–organic thin films on nanoplasmonic structures towards FRET-based applications
Nanoscale ( IF 5.8 ) Pub Date : 2023-09-18 , DOI: 10.1039/d3nr04094a Amr Ghazy 1 , Jonas Ylönen 2 , Nagarajan Subramaniyam 2 , Maarit Karppinen 1
Nanoscale ( IF 5.8 ) Pub Date : 2023-09-18 , DOI: 10.1039/d3nr04094a Amr Ghazy 1 , Jonas Ylönen 2 , Nagarajan Subramaniyam 2 , Maarit Karppinen 1
Affiliation
We present a novel atomic/molecular layer deposition (ALD/MLD) process for europium–organic thin films based on Eu(thd)3 and 2-hydroxyquinoline-4-carboxylic acid (HQA) precursors. The process yields with appreciably high growth rate luminescent Eu-HQA thin films in which the organic HQA component acts as a sensitizer for the red Eu3+ luminescence, extending the excitation wavelength range up to ca. 400 nm. We moreover deposit these films on nanoplasmonic structures to achieve a twentyfold enhanced emission intensity. Finally, we demonstrate the FRET-type energy transfer process for our Eu-HQA coated nanoplasmonic structures in combination with commercial Alexa647 fluorophor, underlining their potential towards novel bioimaging applications.
中文翻译:
纳米等离子体结构上铕有机薄膜的原子/分子层沉积,用于基于 FRET 的应用
我们提出了一种基于 Eu(thd) 3和 2-羟基喹啉-4-羧酸 (HQA) 前体的铕有机薄膜的新型原子/分子层沉积 (ALD/MLD) 工艺。该过程产生了相当高的生长速率发光Eu-HQA薄膜,其中有机HQA成分充当红色Eu 3+发光的敏化剂,将激发波长范围扩展至约100nm 。400纳米。此外,我们将这些薄膜沉积在纳米等离子体结构上,以实现发射强度提高二十倍。最后,我们展示了 Eu-HQA 涂层纳米等离子体结构与商业 Alexa647 荧光团相结合的 FRET 型能量转移过程,强调了它们在新型生物成像应用中的潜力。
更新日期:2023-09-18
中文翻译:
纳米等离子体结构上铕有机薄膜的原子/分子层沉积,用于基于 FRET 的应用
我们提出了一种基于 Eu(thd) 3和 2-羟基喹啉-4-羧酸 (HQA) 前体的铕有机薄膜的新型原子/分子层沉积 (ALD/MLD) 工艺。该过程产生了相当高的生长速率发光Eu-HQA薄膜,其中有机HQA成分充当红色Eu 3+发光的敏化剂,将激发波长范围扩展至约100nm 。400纳米。此外,我们将这些薄膜沉积在纳米等离子体结构上,以实现发射强度提高二十倍。最后,我们展示了 Eu-HQA 涂层纳米等离子体结构与商业 Alexa647 荧光团相结合的 FRET 型能量转移过程,强调了它们在新型生物成像应用中的潜力。