This work assessed boron removal from molten metallurgical grade silicon (MG-Si) using highly basic CaO–CaF₂ flux-powder together with the injection of gaseous oxygen. The dynamics of both the oxygen bubbles and the injected flux particles were examined in detail. An elevated oxygen partial pressure was achieved at the flux–O₂–Si interface and boron removal occurred in a non-equilibrium state. This technique was found to reduce the boron concentration in MG-Si to a level on the order of 1 mass ppm. The effects of the flux particle dynamics at the flux–O₂–Si interface close to the exit of the injection nozzle on boron removal were also evaluated. The rate of boron removal was determined based on the flux particle kinetic energy, which in turn depended on the oxygen gas flow rate and the particle size in the injected flux-powder. Increasing the oxygen flow rate increased the kinetic energy of the flux, allowing it to penetrate the O₂–Si interface at the exit of the nozzle. This effect produced a new reaction field for further removal of boron from molten MG-Si. In contrast, lower flow rates did not allow penetration through the interface. In this case, reaction field formation was inhibited and the boron removal rate was independent of the flux injection rate. Eight consecutive runs for 60 seconds using optimized parameters decreased the boron concentration in MG-Si from 14 to 1.5 mass ppm.

_{这项工作评估了使用高碱性 CaO–CaF 2}熔剂粉末以及注入气态氧从熔融冶金级硅 (MG-Si) 中去除硼的情况。详细检查了氧气泡和注入的焊剂颗粒的动力学。_{在助熔剂-O 2} -Si界面处实现了升高的氧分压，并且在非平衡状态下发生硼去除。该技术被发现可以将 MG-Si 中的硼浓度降低至 1 质量 ppm 的水平。_{通量粒子动力学对通量-O 2}的影响靠近注射喷嘴出口的-Si 界面对硼的去除也进行了评估。硼去除率是根据助熔剂颗粒动能确定的，而助熔剂颗粒动能又取决于氧气流速和注入的助熔剂粉末中的颗粒尺寸。增加氧气流量会增加通量的动能，使其能够穿透 O ₂–Si 界面位于喷嘴出口处。这种效应产生了一个新的反应场，用于进一步从熔融的 MG-Si 中去除硼。相反，较低的流速不允许渗透通过界面。在这种情况下，反应场的形成受到抑制，并且硼去除率与助熔剂注入率无关。使用优化参数进行 60 秒的连续八次运行，将 MG-Si 中的硼浓度从 14 质量 ppm 降低至 1.5 质量 ppm。