Diamond Immersion Photodetector for 193 nm Lithography,Advanced Optical Materials

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Diamond Immersion Photodetector for 193 nm Lithography
Advanced Optical Materials ( IF 8.0 ) Pub Date : 2023-08-30 , DOI: 10.1002/adom.202301533
Lu Cheng ₁ , Zhao Wang ₁ , Wei Zheng ₁

Affiliation

At present, most photodetectors work in atmospheric or vacuum environments, which leaves a large gap for detection under liquid conditions. However, this kind of research is of great significance, especially for the monitoring of 193 nm vacuum UV (VUV) light in the immersion lithography system underwater. Here, the p-type diamond single crystal (PDSC) is applied as the photoelectrode for the construction of a VUV immersion photodetector with a PDSC-ultra-pure water-Pt structure and a high response to 193 nm light. Under 193 nm excitation (@8 µW) and at 0 V, the PDSC immersion photodetector demonstrates a favorable characteristic of having a high responsivity of 5 mA·W⁻¹. Due to its exceptional performance, this device has been proven to function as a highly-sensitive and self-powered VUV detector, with significant potential for utilization in the monitoring of 193 nm light in immersion lithography systems.

中文翻译：

用于 193 nm 光刻的金刚石浸入式光电探测器

目前，大多数光电探测器工作在大气或真空环境中，这给液体条件下的检测留下了很大的差距。然而，这类研究意义重大，特别是对于水下浸没式光刻系统中193 nm真空紫外（VUV）光的监测。在这里，采用p型金刚石单晶（PDSC）作为光电极，构建了具有PDSC-超纯水-Pt结构并对193 nm光具有高响应的VUV浸没式光电探测器。^{在193 nm激发（@8 µW）和0 V电压下，PDSC浸没式光电探测器表现出具有5 mA·W -1}高响应度的良好特性。由于其卓越的性能，该设备已被证明可以作为高灵敏度、自供电的 VUV 探测器，在监测浸没式光刻系统中的 193 nm 光方面具有巨大的潜力。

更新日期：2023-08-30

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