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Insights on CaTiS3 films grown by pulsed laser deposition
Journal of Alloys and Compounds ( IF 5.8 ) Pub Date : 2023-07-11 , DOI: 10.1016/j.jallcom.2023.171272
T. Fix , S. Raissi , D. Muller , C. Bouillet , D. Preziosi , A. Slaoui

We attempt to grow perovskite CaTiS3 by pulsed laser deposition (PLD) on various substrates using a CaS:TiS2 target. Using Al2O3 (0001) substrates at 600 °C deposition temperature in vacuum, Ca1.0Ti1.05S2.48Oy stoichiometry is measured by Energy-dispersive X-ray spectroscopy (EDS) and Ca1.0Ti1.0S2.0O0.7 by Rutherford Backscattering Spectrometry (RBS). This indicates that when the films are grown in vacuum at moderate temperature, a high amount of S can be transferred from the target to the film. While no phase segregation of CaS and TiS2 could be observed, no perovskite CaTiS3 phase could be obtained, but rather a phase governed by van der Waals interactions. The films show a highly doped n-type semiconductor behavior with absorption coefficient in the 105 cm−1 range at 350–2500 nm but no surface photovoltage signal. This work should stimulate further experimental efforts in PLD growth of chalcogenides and chalcogenide perovskites.



中文翻译:

对脉冲激光沉积生长的 CaTiS3 薄膜的见解

我们尝试使用 CaS:TiS 2靶材通过脉冲激光沉积 (PLD) 在各种基底上生长钙钛矿 CaTiS 3。使用 Al 2 O 3 (0001) 基材,在真空中沉积温度为 600 °C,通过能量色散 X 射线光谱 (EDS) 和 Ca 1.0 Ti 1.0 S 2.0 O 0.7测量 Ca 1.0 Ti 1.05 S 2.48 O y化学计量。通过卢瑟福背散射光谱法 (RBS) 进行。这表明当薄膜在中等温度的真空中生长时,大量的S可以从靶材转移到薄膜上。虽然没有观察到CaS和TiS 2的相分离,但没有获得钙钛矿CaTiS 3相,而是由范德华相互作用控制的相。这些薄膜表现出高掺杂的n型半导体行为,在350-2500 nm处吸收系数在10 5 cm -1范围内,但没有表面光电压信号。这项工作应该会激发硫族化物和硫族化物钙钛矿 PLD 生长的进一步实验工作。

更新日期:2023-07-13
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