Abstract

The synthesis of CeO₂ nanoparticles for CeO₂ based slurry gains continuous emphasis on improving its performance in the chemical mechanical polishing of dielectric materials. Urea was selected to dominate the growth and morphology during the calcination process. Thermogravimetry experiments were used to analyze the the decomposition behavior. Particle morphology and size were analyzed. Crystalline phase information and surface valence were used to compare the differences in surface physical and chemical properties of ceria by different synthesis process. The CeO₂ nanoparticles synthesized with urea were dispersed in water as slurry. The particle sizes of CeO₂ were measured by dynamic light scattering. The Zeta potential of CeO₂ dispersion were measured to show dispersing performance. The CeO₂ nanoparticles synthesized with urea condensation show good monodisperse properties. The material removal rate of silicon oxide and surface quality after chemical mechanical polishing were selected to evaluate the chemical mechanical polishing performance. The CeO₂ nanoparticles synthesized with urea condensation not only yielded better surface quality results than the commercial slurry but also showed a 153% (pH = 4) and 100% (pH = 10) increase in the material removal rate of silicon oxide compared to commercial.

Graphical Abstract

中文翻译：

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用于化学机械抛光的尿素缩合衍生的 CeO2 纳米粒子的合成

摘要

用于CeO _{2基浆料的CeO 2}纳米颗粒的合成一直受到重视，以提高其在介电材料化学机械抛光中的性能。选择尿素来控制煅烧过程中的生长和形态。热重实验用于分析分解行为。分析颗粒形态和尺寸。利用晶相信息和表面化合价比较了不同合成工艺制备的二氧化铈表面理化性质的差异。将用尿素合成的CeO ₂纳米颗粒作为浆料分散在水中。_{CeO 2}的粒径通过动态光散射测量。CeO的Zeta电位测量_{2个分散体以显示分散性能。}尿素缩合合成的CeO ₂纳米颗粒表现出良好的单分散性能。选择化学机械抛光后的氧化硅材料去除率和表面质量来评价化学机械抛光性能。用尿素缩合合成的CeO ₂纳米颗粒不仅产生了比商业浆料更好的表面质量结果，而且与商业浆料相比，二氧化硅的材料去除率增加了 153% (pH = 4) 和 100% (pH = 10) .

图形概要