Mo₂C, which has a unique electronic structure similar to the electronic structure of Pt, is considered as the material with the greatest potential to replace Pt as a catalyst for the electrocatalytic hydrogen evolution reaction (HER). However, Mo₂C thin films have not attracted enough attention in the field of electrocatalysis. This work proposes a method for preparing Mo₂C thin films as a catalyst for electrocatalytic HER through radiofrequency magnetron sputtering. The HER activity of the Mo₂C thin film in acidic and alkaline media is studied by changing the deposition power of the Mo₂C target and doping Ni for structural modification. Results show that increasing the deposition power of Mo₂C can significantly enhance the HER activity of the films in acidic and alkaline media, and metal Ni doping can further enhance the HER activity of the Mo₂C films. In an alkaline environment at a current density of 10 mA cm⁻², the films demonstrate an overpotential of as low as 163 mV with a Tafel slope of 107 mV·dec⁻¹. In acidic media, the films present the corresponding overpotential of 201 mV and a Tafel slope of as low as 96 mV·dec⁻¹. Moreover, the Ni-doped Mo₂C films have excellent HER stability. The synergy between doped Ni and Mo vacancies optimizes the strength of the Mo–H bond and the adsorption and desorption equilibrium of active H, thus enhancing HER kinetics. This work guides the possible structural design of Mo₂C thin films for electrocatalytic HER.

Mo ₂ C具有与Pt电子结构相似的独特电子结构，被认为是最有潜力替代Pt作为电催化析氢反应（HER）催化剂的材料。然而，Mo ₂ C薄膜在电催化领域尚未引起足够的重视。本工作提出了一种通过射频磁控溅射制备Mo ₂ C薄膜作为电催化HER催化剂的方法。_{通过改变Mo 2}的沉积功率研究了Mo _{2 C薄膜在酸性和碱性介质中}的HER活性。C靶材和掺杂Ni进行结构改性。_{结果表明，提高Mo 2} C沉积功率可以显着增强薄膜在酸性和碱性介质中的HER活性，金属Ni掺杂可以进一步增强Mo ₂ C薄膜的HER活性。^{在电流密度为10 mA cm -2}的碱性环境中，薄膜表现出低至163 mV的过电势，塔菲尔斜率为107 mV·dec ^-1。在酸性介质中，薄膜表现出相应的201 mV的过电势和低至96 mV·dec ^-1的塔菲尔斜率。此外，Ni掺杂的Mo ₂ C薄膜具有优异的HER稳定性。掺杂 Ni 和 Mo 空位之间的协同作用优化了强度Mo-H 键和活性 H 的吸附和解吸平衡，从而增强 HER 动力学。_{这项工作指导了用于电催化 HER 的 Mo 2} C 薄膜的可能结构设计。