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Biobased Epoxy Resin with Inherently Deep-UV Photodegradability for a Positive Photoresist and Anticounterfeiting
ACS Applied Polymer Materials ( IF 4.4 ) Pub Date : 2023-03-29 , DOI: 10.1021/acsapm.3c00291
Dandan Jin 1 , Jinyue Dai 1 , Weiwei Zhao 1 , Xiaoqing Liu 1
Affiliation  

Biobased epoxy resins have received widespread attention due to their substitution for petroleum-based ones in conventional fields but are rarely reported in functional materials. Herein, a biobased epoxy resin with inherently deep-UV photodegradability was reported. The strategy was based on the [2 + 2] photocycloaddition of trans-cinnamic acid, a renewable resource, to generate a cyclobutane structure in the backbone, which was cleaved upon <280 nm light irradiation. The as-prepared epoxy resin showed high thermal stability and good thermomechanical properties. Meanwhile, owing to the ozonosphere blocking the UV light with a wavelength of <290 nm, the stability of this epoxy resin was guaranteed under a normal environment. When exposed to deep-UV light irradiation, degradation occurred. The degradation mechanism study demonstrated that molecular packing (crystalline/amorphism) was important in determining its degradability. Based on its photoresponsive features, the feasibility of this epoxy resin in the fields of a positive photoresist and anticounterfeiting was well explored. This work provides an attractive strategy for developing biobased epoxy resins to expand their potential application fields.

中文翻译:

具有固有深紫外光降解性的生物基环氧树脂用于正性光刻胶和防伪

生物基环氧树脂由于在常规领域替代石油基环氧树脂而受到广泛关注,但在功能材料中却鲜有报道。在此,报道了一种具有固有深紫外光降解性的生物基环氧树脂。该策略基于反式的 [2 + 2] 光环加成- 肉桂酸,一种可再生资源,在骨架中产生环丁烷结构,在 <280 nm 的光照射下被切割。所制备的环氧树脂具有较高的热稳定性和良好的热机械性能。同时,由于臭氧层阻挡了波长<290 nm的紫外光,保证了该环氧树脂在正常环境下的稳定性。当暴露于深紫外光照射时,发生降解。降解机制研究表明,分子堆积(结晶/无定形)在决定其可降解性方面很重要。基于其光响应特性,该环氧树脂在正性光刻胶和防伪领域的可行性得到了很好的探索。
更新日期:2023-03-29
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