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Effect of steric hindrance on the interfacial connection of MOF-on-MOF architectures
Nanoscale Advances ( IF 4.6 ) Pub Date : 2023-03-06 , DOI: 10.1039/d2na00790h
Junsu Ha 1 , Mingyu Jeon 2 , Jihyun Park 1 , Jihan Kim 2 , Hoi Ri Moon 3
Affiliation  

MOF-on-MOF is attracting great attention due to its improved and/or synergistic properties not exhibited in a single MOF. In particular, the non-isostructural pairs of MOF-on-MOFs can have great potential induced by large heterogeneity, which enables diverse applications in a wide range of fields. HKUST-1@IRMOF is a fascinating platform because the alteration of the IRMOF pores with bulkier substituent groups on the ligands can provide a more microporous environment. However, the sterically hindered linker can affect the seamless growth at the interface, an important issue in practical research fields. Despite many efforts to reveal the growth of a MOF-on-MOF, there is still a lack of studies on a MOF-on-MOF consisting of a sterically hindered interface. Indeed, the effect of a bulky linker at an interface of HKUST-1@IRMOF, a non-isostructural MOF-on-MOF system, has not yet been reported, and thus, how the interfacial strain affects the interfacial growth remains unknown. In this study, we investigate the effect of an interfacial strain on a chemical connection point in an MOF-on-MOF system through a series of theoretical and synthetic experiments using a HKUST-1@IRMOF system. Our results reveal the importance of the proximity of each coordinating site at a MOF-on-MOF interface as well as lattice parameter matching for an effective secondary growth to achieve a well-connected MOF-on-MOF.

中文翻译:

空间位阻对 MOF-on-MOF 结构界面连接的影响

MOF-on-MOF 由于其在单个 MOF 中没有表现出的改进和/或协同特性而引起了极大的关注。特别是,MOF-on-MOFs 的非同构对可以由大的异质性引起巨大的潜力,这使得在广泛领域中的多样化应用成为可能。HKUST-1@IRMOF 是一个引人入胜的平台,因为在配体上用更大的取代基改变 IRMOF 孔可以提供更多的微孔环境。然而,空间位阻连接体会影响界面处的无缝生长,这是实际研究领域中的一个重要问题。尽管为揭示 MOF-on-MOF 的生长做出了许多努力,但仍然缺乏对由空间位阻界面组成的 MOF-on-MOF 的研究。事实上,在 HKUST-1@IRMOF 的界面上,一个笨重的链接器的影响,一个非等结构的 MOF-on-MOF 系统,尚未被报道,因此,界面应变如何影响界面生长仍然未知。在这项研究中,我们使用 HKUST-1@IRMOF 系统通过一系列理论和合成实验研究了界面应变对 MOF-on-MOF 系统中化学连接点的影响。我们的结果揭示了 MOF-on-MOF 界面上每个配位点的接近度以及晶格参数匹配对于有效二次生长以实现连接良好的 MOF-on-MOF 的重要性。我们通过一系列使用 HKUST-1@IRMOF 系统的理论和合成实验研究了界面应变对 MOF-on-MOF 系统中化学连接点的影响。我们的结果揭示了 MOF-on-MOF 界面上每个配位点的接近度以及晶格参数匹配对于有效二次生长以实现连接良好的 MOF-on-MOF 的重要性。我们通过一系列使用 HKUST-1@IRMOF 系统的理论和合成实验研究了界面应变对 MOF-on-MOF 系统中化学连接点的影响。我们的结果揭示了 MOF-on-MOF 界面上每个配位点的接近度以及晶格参数匹配对于有效二次生长以实现连接良好的 MOF-on-MOF 的重要性。
更新日期:2023-03-06
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