Effects of the deposition time and voltage on the characteristics of gold nanoparticles (NPs) thin films, prepared by the electrophoretic deposition (EPD) method on the silver substrate, were investigated experimentally. Au NPs were synthesised using the pulsed laser ablation method in distilled water. The suspended solution of the gold NPs was used as the electrolyte of EPD. An irradiation was carried out by the fundamental wavelength of a Q-switched NdYAG laser at 1064 nm and 7 ns pulse width. The electrophoretic deposition apparatus consisted of two 2 × 2 cm pieces of silver plates as the electrodes. They were immersed in parallel with a 7 mm gap in the gold NP suspension. Five samples of gold NP thin films were prepared at different deposition times and applied voltages. Results show that the roughness, thickness and surface quality of EPD prepared thin films can be strongly controlled by the deposition time and applied voltage. The thickness of deposited films was dependent on the voltage of deposition in which their roughness was increased with increasing the deposition time. Furthermore, the reflection of deposited films was affected by the surface roughness.

中文翻译：

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在银基板上电泳沉积金纳米粒子薄膜

通过实验研究了沉积时间和电压对通过电泳沉积 (EPD) 方法在银基板上制备的金纳米粒子 (NPs) 薄膜特性的影响。在蒸馏水中使用脉冲激光烧蚀法合成 Au NP。金 NPs 的悬浮溶液用作 EPD 的电解质。由 Q 开关 NdYAG 激光器的基本波长在 1064 nm 和 7 ns 脉冲宽度下进行照射。电泳沉积装置由两块 2×2 cm 的银板作为电极。它们以 7 毫米的间隙平行浸入金 NP 悬浮液中。在不同的沉积时间和施加的电压下制备了五个金 NP 薄膜样品。结果表明，粗糙度，EPD 制备的薄膜的厚度和表面质量可以通过沉积时间和施加的电压进行强烈控制。沉积膜的厚度取决于沉积电压，其粗糙度随着沉积时间的增加而增加。此外，沉积膜的反射受表面粗糙度的影响。