For electrochromic applications, binders are frequently employed to appropriately affix thin films to transparent conductive substrates like fluorine and indium-doped tin oxide glass plates (FTO and ITO) and stainless steel (SS). The different WO₃ nanostructure materials are specifically formed using a variety of chemical and physical processes, but WO₃ thin films are not sticky on the substrates without etching. Hence in the present research article, the nanostructured WO₃ thin films were effectively deposited using straightforward, affordable anodic electrodeposition procedures on a variety of substrates, including ITO, FTO, and SS, without etching. The XRD analysis confirmed that the nanostructured WO₃ materials exhibit amorphous nature (a-WO₃). The uniformly deposited a-WO₃ film shows the cracked morphological structures. The deposited a-WO₃ film was confirmed by FTIR analysis. The nanostructured a-WO₃ exhibits excellent electrochromic properties with the highest coloration efficiency (CE) on the FTO 191.4 cm²C^-1 at 633 nm wavelength. The fastest electrochromic coloration (1.22 s) and bleaching (1.29 s) response time of nanostructured a-WO₃ are observed on FTO substrates, respectively. The cycling stability of electrochromic a-WO₃ was shown to be good up to 3000 cycles on FTO substrate.

对于电致变色应用，经常使用粘合剂将薄膜适当地固定到透明导电基板上，例如掺氟和掺铟的氧化锡玻璃板（FTO 和 ITO）和不锈钢 (SS)。不同的WO ₃纳米结构材料是使用各种化学和物理过程专门形成的，但WO ₃薄膜在没有蚀刻的情况下不会粘附在基板上。因此，在本研究文章中，纳米结构 WO ₃薄膜使用简单、经济的阳极电沉积程序在各种基材（包括 ITO、FTO 和 SS）上有效沉积，无需蚀刻。XRD分析证实纳米结构的WO ₃材料表现出无定形性质 (a-WO ₃ )。均匀沉积的a-WO ₃薄膜显示出裂纹形貌结构。通过FTIR分析确认沉积的a-WO ₃膜。纳米结构的 a-WO _{3在 FTO 191.4 cm} ² C ^-1在 633 nm 波长处表现出优异的电致变色性能和最高的着色效率 (CE) 。分别在 FTO 基板上观察到纳米结构 a-WO ₃的最快电致变色响应时间 (1.22 s) 和漂白响应时间 (1.29 s) 。电致变色 a-WO ₃的循环稳定性在 FTO 基板上显示良好，高达 3000 次循环。