The residual stresses of micro-and nano-crystalline diamond thin films grown using hot filament chemical vapor deposition (HFCVD) are of great importance as they affect the resulting film quality. The range of these stresses varies widely, as they are controlled by the parameters. In this paper, many diamond thin films ranging from microcrystalline to ultra-nanocrystalline were prepared under different process parameters using hot filament CVD. The substrate deflection technique was implemented to measure the stresses in the prepared diamond films. Results show that, depending on the applied parameters, the diamond film stress can vary from tensile to compressive which gives us the possibility to control and optimize the stresses in such films.

使用热丝化学气相沉积 (HFCVD) 生长的微晶和纳米晶金刚石薄膜的残余应力非常重要，因为它们会影响所得薄膜的质量。这些应力的范围变化很​​大，因为它们受参数控制。在本文中，使用热丝 CVD 在不同的工艺参数下制备了从微晶到超纳米晶的许多金刚石薄膜。实施基板偏转技术以测量制备的金刚石薄膜中的应力。结果表明，根据应用的参数，金刚石薄膜应力可以从拉伸变化到压缩，这使我们有可能控制和优化此类薄膜中的应力。