The influence of nano-silica doping on the growth behavior and corrosion resistance of γ-APS silane films fabricated by electrochemical-assisted deposition was systematically investigated by reflection absorption infrared spectroscopy, electrochemical impedance spectroscopy, atomic force microscopy, scanning electron microscopy, energy-dispersive X-ray spectrometry, contact angle test and neutral salt spray test. Density functional theory calculation was also applied to elaborate the adsorption behavior of γ-APS on low carbon steel surfaces. And meanwhile, the changes of surface coverage and dissolved oxygen reduction in the cathode surface over time were intensively analyzed according to the I–t curve during electrodeposition process. The experimental results revealed that the impedance values of the composite films firstly increased and then decreased with increasing nano-silica concentration, and there was a critical doping concentration about 0.4 g·L⁻¹, under which the obtained γ-APS silane composite films presented high compactness and protective properties. Other results were highly consistent with the electrochemical results. Moreover, the hydroxyl-rich nano-silica was also involved in the chemical reactions that occurred on the metal surfaces, and the influence mechanism was proposed.

采用反射吸收红外光谱、电化学阻抗谱、原子力显微镜、扫描电子显微镜、能量色散法系统研究了纳米二氧化硅掺杂对电化学辅助沉积制备的γ-APS硅烷薄膜生长行为和耐腐蚀性能的影响。 X射线光谱法、接触角试验和中性盐雾试验。还应用密度泛函理论计算来阐述γ-APS在低碳钢表面的吸附行为。同时，根据I - t对阴极表面覆盖率和溶解氧还原随时间的变化进行了深入分析。电沉积过程中的曲线。实验结果表明，随着纳米二氧化硅浓度的增加，复合薄膜的阻抗值先增大后减小，在0.4 g·L ^-1左右存在一个临界掺杂浓度，在此临界掺杂浓度下，得到的γ-APS硅烷复合薄膜呈现出高致密性和保护性能。其他结果与电化学结果高度一致。此外，富羟基纳米二氧化硅还参与了金属表面发生的化学反应，并提出了影响机理。