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Enhanced Magnetoresistance of Doped WTe2 Single Crystals
ACS Applied Electronic Materials ( IF 4.3 ) Pub Date : 2022-08-30 , DOI: 10.1021/acsaelm.2c00763
Erh-Chen Lin, Yu-Ting Lin, Cheng-Tse Chou, Chun-An Chen, Yun-Jei Wu, Po-Han Chen, Shang-Fan Lee, Chia-Seng Chang, Yung-Fu Chen, Yi-Hsien Lee
ACS Applied Electronic Materials ( IF 4.3 ) Pub Date : 2022-08-30 , DOI: 10.1021/acsaelm.2c00763
Erh-Chen Lin, Yu-Ting Lin, Cheng-Tse Chou, Chun-An Chen, Yun-Jei Wu, Po-Han Chen, Shang-Fan Lee, Chia-Seng Chang, Yung-Fu Chen, Yi-Hsien Lee
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Magnetoresistance (MR), a change of electrical resistance in response to an external magnetic field, revolutionizes the fundamental study of spintronics and leads to applications in solid-state memory devices. Tungsten ditelluride (WTe2) exhibits an extremely large MR below 10 K and is highlighted to explore unique properties at high temperatures, such as ferroelectricity at 300 K and the quantum spin Hall effect at 100 K. However, these remarkable phenomena only appear in the exfoliated crystals protected by h-BN encapsulation. Here, an enhanced MR is demonstrated in the synthesized WTe2 single crystals. The high crystallinity and tunable thickness of the WTe2 single crystals are achieved by promoter-assisted chemical vapor deposition. The MR of WTe2 shows a nonsaturating behavior with a positive MR of ∼2000% at 2 K. A large MR of ∼50% is observed at 80 K in the as-grown single crystals, which is comparable to that of bulk WTe2 and experimentally achieved for the first time. Moreover, the MR is further enhanced by fluoropolymer encapsulation, which effectively induces p-doping in WTe2 for promoting carrier compensation. This work indicates the synthesized WTe2 single crystals as a promising candidate for next-generation spintronics devices.
中文翻译:
掺杂 WTe2 单晶的增强磁阻
磁阻 (MR) 是一种响应外部磁场的电阻变化,它彻底改变了自旋电子学的基础研究,并导致在固态存储设备中的应用。二碲化钨 (WTe 2 ) 在 10 K 以下表现出极大的 MR,并强调探索高温下的独特性质,例如 300 K 的铁电性和 100 K 的量子自旋霍尔效应。然而,这些显着现象仅出现在由 h-BN 封装保护的剥离晶体。这里,在合成的WTe 2单晶中展示了增强的MR。WTe 2单晶的高结晶度和可调厚度是通过促进剂辅助化学气相沉积实现的。WTe的MR图2显示了非饱和行为,在 2 K 时正 MR 为 ~2000%。在 80 K 时,在生长的单晶中观察到了 ~50% 的大 MR,这与块状 WTe 2相当,并通过实验实现了第一次。此外,通过氟聚合物封装进一步增强了MR,这有效地诱导了WTe 2中的p掺杂以促进载流子补偿。这项工作表明合成的WTe 2单晶是下一代自旋电子器件的有希望的候选者。
更新日期:2022-08-30
中文翻译:

掺杂 WTe2 单晶的增强磁阻
磁阻 (MR) 是一种响应外部磁场的电阻变化,它彻底改变了自旋电子学的基础研究,并导致在固态存储设备中的应用。二碲化钨 (WTe 2 ) 在 10 K 以下表现出极大的 MR,并强调探索高温下的独特性质,例如 300 K 的铁电性和 100 K 的量子自旋霍尔效应。然而,这些显着现象仅出现在由 h-BN 封装保护的剥离晶体。这里,在合成的WTe 2单晶中展示了增强的MR。WTe 2单晶的高结晶度和可调厚度是通过促进剂辅助化学气相沉积实现的。WTe的MR图2显示了非饱和行为,在 2 K 时正 MR 为 ~2000%。在 80 K 时,在生长的单晶中观察到了 ~50% 的大 MR,这与块状 WTe 2相当,并通过实验实现了第一次。此外,通过氟聚合物封装进一步增强了MR,这有效地诱导了WTe 2中的p掺杂以促进载流子补偿。这项工作表明合成的WTe 2单晶是下一代自旋电子器件的有希望的候选者。