Journal of Materials Science: Materials in Electronics ( IF 2.8 ) Pub Date : 2022-08-02 , DOI: 10.1007/s10854-022-08777-7 K. Thilaga , P. Selvarajan , S. M. Abdul Kader
A new single crystal of cesium sulphate-doped 4-methoxyaniline (CS-4MOA) was obtained by the solvent evaporation approach. XRD manifests that the CS-4MOA crystallizes in orthorhombic crystal structure. The existence of several functional groups in the CS-4MOA crystal is affirmed by FTIR analysis. SEM-EDAX analysis was performed to examine the surface morphology and the composition of CS-4MOA sample. Ultraviolet–visible spectral study validates the transparency of CS-4MOA in the region of 330–1100 nm. The thermal steadiness of the CS-4MOA crystal was examined using TG/DTA, which revealed that it was stable up to 88 °C. The mechanical stability of CS-4MOA crystal was assessed through Vickers microhardness analysis. VSM analysis was used to evaluate the magnetic behaviour of the CS-4MOA crystal. The electrical characteristics of the CS-4MOA were investigated by impedance study for various temperatures. The NLO parameters of CS-4MOA were computed by Z-scan technique. The existence of second order nonlinear optical susceptibility in CS-4MOA was confirmed by the SHG investigation. Additionally, antimicrobial activity of CS-4MOA was performed against bacterial strains and fungal pathogen for medicinal applications.
中文翻译:
硫酸铯掺杂 4-甲氧基苯胺的晶体生长、结构、表面、光学、热学、机械、磁学、电学研究:用于 NLO 和抗菌应用的单晶
通过溶剂蒸发法获得了一种新的硫酸铯掺杂4-甲氧基苯胺(CS-4MOA)单晶。XRD表明CS-4MOA以正交晶体结构结晶。FTIR分析证实了CS-4MOA晶体中存在几个官能团。进行 SEM-EDAX 分析以检查 CS-4MOA 样品的表面形态和组成。紫外-可见光谱研究验证了 CS-4MOA 在 330-1100 nm 区域的透明度。使用 TG/DTA 检查 CS-4MOA 晶体的热稳定性,结果表明它在高达 88 °C 时仍保持稳定。通过维氏显微硬度分析评估 CS-4MOA 晶体的机械稳定性。VSM 分析用于评估 CS-4MOA 晶体的磁行为。CS-4MOA 的电特性通过不同温度下的阻抗研究进行了研究。CS-4MOA的NLO参数是通过Z扫描技术计算的。通过 SHG 研究证实了 CS-4MOA 中存在二阶非线性光学磁化率。此外,CS-4MOA 对细菌菌株和真菌病原体的抗菌活性可用于药用。