The availability of graphene and other two-dimensional (2D) materials on a wide range of substrates forms the basis for large-area applications, such as graphene integration with silicon-based technologies, which requires graphene on silicon with outperforming carrier mobilities. However, 2D materials were only produced on limited archetypal substrates by chemical vapor deposition approaches. Reliable after-growth transfer techniques, that do not produce cracks, contamination, and wrinkles, are critical for layering 2D materials onto arbitrary substrates. Here we show that, by incorporating oxhydryl groups-containing volatile molecules, the supporting films can be deformed under heat to achieve a controllable conformal contact, enabling the large-area transfer of 2D films without cracks, contamination, and wrinkles. The resulting conformity with enhanced adhesion facilitates the direct delamination of supporting films from graphene, providing ultraclean surfaces and carrier mobilities up to 1,420,000 cm² V⁻¹ s⁻¹ at 4 K.

石墨烯和其他二维 (2D) 材料在各种基底上的可用性构成了大面积应用的基础，例如石墨烯与硅基技术的集成，这需要硅基石墨烯具有出色的载流子迁移率。然而，二维材料仅通过化学气相沉积方法在有限的原型基板上生产。可靠的后生长转移技术不会产生裂纹、污染和皱纹，对于将二维材料分层到任意基板上至关重要。在这里，我们表明，通过加入含羟基的挥发性分子，支撑膜可以在加热下变形以实现可控的共形接触，从而实现二维膜的大面积转移而不会出现裂纹、污染和皱纹。4 K 时为² V ⁻¹ s ^{−1 。}