The rise of twistronics has increased the attention of the community to the twist-angle-dependent properties of two-dimensional van der Waals integrated architectures. Clarification of the relationship between twist angles and interlayer mechanical interactions is important in benefiting the design of two-dimensional twisted structures. However, current mechanical methods have critical limitations in quantitatively probing the twist-angle dependence of two-dimensional interlayer interactions in monolayer limits. Here we report a nanoindentation-based technique and a shearing-boundary model to determine the interlayer mechanical interactions of twisted bilayer MoS₂. Both in-plane elastic moduli and interlayer shear stress are found to be independent of the twist angle, which is attributed to the long-range interaction of intermolecular van der Waals forces that homogenously spread over the interfaces of MoS₂. Our work provides a universal approach to determining the interlayer shear stress and deepens the understanding of twist-angle-dependent behaviours of two-dimensional layered materials.

twistronics 的兴起增加了社区对二维范德华集成架构的扭转角相关属性的关注。澄清扭曲角和层间机械相互作用之间的关系对于二维扭曲结构的设计非常重要。然而，目前的机械方法在定量探测单层极限中二维层间相互作用的扭曲角依赖性方面存在严重局限性。在这里，我们报告了一种基于纳米压痕的技术和剪切边界模型来确定扭曲双层 MoS _{2的层间机械相互作用}. _{发现面内弹性模量和层间剪切应力都与扭转角无关，这归因于均匀分布在MoS 2}界面上的分子间范德华力的长程相互作用。我们的工作提供了一种确定层间剪应力的通用方法，并加深了对二维层状材料的扭曲角相关行为的理解。