The deep oxidation of toluene is recognized as a major challenge for photocatalytic oxidation of toluene. Herein, we introduced oxygen vacancies into CeO₂ nanosheets through novel anion-removal of Ce-LDH, with the calcining temperatures of 750, 850, 950 °C. The photocatalytic toluene performance was ordered by CeMO-850 > CeMO-750 > CeMO-950, and CeMO-850 had better activity than P25, common CeO₂, and CeO₂-H₂. Different reaction pathways were founded on CeMO photocatalysts, i.e., on CeMO-950 and CeMO-750, the cresol and hydroquinone intermediates were observed, which hindered toluene adsorption/activation and were hard to deep-mineralization. Whereas, more benzoic acid, open-loop oxygen-containing intermediates were observed on CeMO-850, which were resulted from its oxygen vacancies (Ov), i.e., surface Ov and Ce³⁺ were beneficial for toluene adsorption, B acid sites and active radicals’ generation, respectively, and bulk Ov were helpful for oxygen mobility and efficient deep-mineralization. The mechanism of Ov generation and toluene degradation were proposed.

甲苯的深度氧化被认为是甲苯光催化氧化的主要挑战。在此，我们通过Ce-LDH的新型阴离子去除将氧空位引入CeO ₂纳米片，煅烧温度分别为750、850、950°C。甲苯的光催化性能依次为CeMO-850 > CeMO-750 > CeMO-950，CeMO-850的活性优于P25、普通CeO ₂和CeO ₂ -H _{2 。}. 在CeMO光催化剂上建立了不同的反应途径，即在CeMO-950和CeMO-750上观察到甲酚和对苯二酚中间体，阻碍了甲苯的吸附/活化，难以深度矿化。而在 CeMO-850 上观察到更多的苯甲酸、开环含氧中间体，这是由于其氧空位 (Ov) 造成的，即表面 Ov 和 Ce ³⁺有利于甲苯吸附、B 酸位和活性自由基的产生和体积 Ov 分别有助于氧气的迁移和有效的深度矿化。提出了Ov生成和甲苯降解的机理。