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Realizing Spontaneously Regular Stacking of Pristine Graphene Oxide by a Chemical-Structure-Engineering Strategy for Mechanically Strong Macroscopic Films
ACS Nano ( IF 15.8 ) Pub Date : 2022-05-23 , DOI: 10.1021/acsnano.1c10561
Yu Zhang 1 , Shijun Wang 2 , Pingping Tang 1 , Zhenfang Zhao 3 , Zhiping Xu 2 , Zhong-Zhen Yu 1, 3 , Hao-Bin Zhang 1, 3
Affiliation  

Mechanical–electrical properties of macroscopic graphene films derived from graphene oxide (GO) sheets are substantially restricted by their surface wrinkles and structural misalignment. Herein, we propose a chemical-structure-engineering strategy to realize the spontaneously regular stacking of modified GO (GO-m) with trace carboxyl. The highly aligned GO-m film delivers a fracture strength and modulus of nearly 3- and 5-fold higher than a wrinkled film with conventional Hummer’s method derived GO (GO-c). The favorable assembly pattern of GO-m sheets is attributed to their decreased interfacial friction on the atomic scale, which weakens their local gelation capability for freer configuration adjustment during the assembly process. The chemical structure of GO-m can be further engineered by an epoxide-to-hydroxyl reaction, achieving a record high tensile strength of up to 631 MPa for the pristine GO film. By exploring the relationship between the surface terminations of GO and its stacking mode, this work proves the feasibility to realize high-performance macroscopic materials with optimized microstructure through the chemical modulation of nanosheet assembly.

中文翻译:

通过机械强度宏观薄膜的化学结构工程策略实现原始氧化石墨烯的自发规则堆叠

源自氧化石墨烯 (GO) 片的宏观石墨烯薄膜的机械-电气特性在很大程度上受到其表面皱纹和结构错位的限制。在此,我们提出了一种化学结构工程策略来实现具有微量羧基的改性 GO (GO- m ) 的自发规则堆叠。高度对齐的 GO- m薄膜提供的断裂强度和模量比采用传统 Hummer 方法衍生的 GO (GO- c )的褶皱薄膜高近 3 倍和 5 倍。GO- m的有利组装模式片材归因于它们在原子尺度上减少的界面摩擦,这削弱了它们在组装过程中更自由的配置调整的局部凝胶化能力。GO- m的化学结构可以通过环氧化物到羟基的反应进一步设计,使原始 GO 薄膜达到创纪录的高达 631 MPa 的拉伸强度。通过探索 GO 的表面终端与其堆叠模式之间的关系,该工作证明了通过纳米片组装的化学调制实现具有优化微观结构的高性能宏观材料的可行性。
更新日期:2022-05-23
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