This paper elaborates on the thickness-dependent structural, optical, and electrical properties of Erbium(III)-Tris-8-hydroxyquinolinato (ErQ3) films. The surface morphology reveals the grains that consolidate to make denser films with increasing film thickness. The ErQ3 grain sizes increased from 80 to 187 nm as the thickness increased from 80 to 190 nm. From XRD analysis, the ErQ3 films are partially crystallized with only one peak at 2θ = 9.80° and a plateau in the range of 20–40°. Electrical measurement of ErQ3 films showed that the electrical conductivity had a strong dependence on film thickness. Transmittance and reflectance measurements showed that the films exhibited a 2.60 eV bandgap, and it does not depend on the thickness of the film. Also, the dispersion of the refractive index was analyzed to determine the essential parameters. The nonlinear optical parameters such as nonlinear refractive index and third-order nonlinear optical susceptibility were calculated by Miller's principles.

本文详细阐述了 Erb(III)-Tris-8-hydroxyquinolinato (ErQ3) 薄膜的厚度依赖性结构、光学和电学特性。表面形态显示随着薄膜厚度的增加，晶粒会合并形成更致密的薄膜。随着厚度从 80 增加到 190 nm，ErQ3 晶粒尺寸从 80 增加到 187 nm。从 XRD 分析，ErQ3 薄膜部分结晶，在 2 θ处只有一个峰 = 9.80° 和 20-40° 范围内的平台。ErQ3薄膜的电学测量表明，电导率对薄膜厚度有很强的依赖性。透射率和反射率测量表明，薄膜的带隙为 2.60 eV，并且与薄膜的厚度无关。此外，还分析了折射率的色散以确定基本参数。非线性光学参数如非线性折射率和三阶非线性光学磁化率通过米勒原理计算。