Structural, microstructural, and ferroelectric studies of polyvinylidene fluoride-hexafluoropropylene (PVDF-HFP) thin films in Ag/Cu/PVDF-HFP/Cu capacitor structures,Journal of Applied Polymer Science

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Structural, microstructural, and ferroelectric studies of polyvinylidene fluoride-hexafluoropropylene (PVDF-HFP) thin films in Ag/Cu/PVDF-HFP/Cu capacitor structures
Journal of Applied Polymer Science ( IF 2.7 ) Pub Date : 2022-01-26 , DOI: 10.1002/app.52187
Jyotirmoy Roy ₁ , Raghavendar Chikkonda ₁ , Gara Kishor ₁ , Akhil Raman Thankamani Sathyanathan ₂ , K. C. James Raju ₂ , Ramesh Babu Gangineni ₁

Affiliation

In this article, the structural, microstructural, and ferroelectric characteristics of polyvinylidene fluoride-hexafluoropropylene (PVDF-HFP) thin films in Ag/Cu/PVDF-HFP/Cu capacitor structures have been investigated. The bottom interfaces glass or Cu/glass influence upon the PVDF-HFP thin-film crystal structure and microstructure have been evaluated using grazing incidence X-ray diffractometer and atomic force microscopy. Quasi-static current–voltage loops, the polarization versus electric field loops measured at varied applied frequencies (100 mHz–1 Hz) and electric field amplitudes (2.5–27.5 MV/m) are utilized to comprehend the ferroelectric characteristics of PVDF-HFP thin films. Furthermore, the observed linear dependency between coercive field and frequency is linked to the homogenous domain growth model proposed by Kolmogorov-Avrami-Ishibashi.

中文翻译：

Ag/Cu/PVDF-HFP/Cu 电容器结构中聚偏二氟乙烯-六氟丙烯 (PVDF-HFP) 薄膜的结构、微观结构和铁电研究

本文研究了聚偏二氟乙烯-六氟丙烯 (PVDF-HFP) 薄膜在 Ag/Cu/PVDF-HFP/Cu 电容器结构中的结构、微观结构和铁电特性。底部界面玻璃或铜/玻璃对 PVDF-HFP 薄膜晶体结构和微观结构的影响已使用掠入射 X 射线衍射仪和原子力显微镜进行了评估。准静态电流-电压回路、在不同应用频率 (100 mHz–1 Hz) 和电场幅度 (2.5–27.5 MV/m) 下测量的极化与电场回路可用于理解 PVDF-HFP 薄的铁电特性电影。此外，

更新日期：2022-01-26

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