A compound, 3-ethyl-3-hydroxymethyloxetane (EHO), was synthesized with diethyl carbonate and trihydroxypropane as raw materials, 3-ethyl-3-allylmethoxy oxetane (EAMO) was synthesized with EHO and allyl bromide, and 1,1,3,3,5,5-hexamethyl-1,5-bis[(3-ethyl-3-methoxyoxetane)propyl]trisiloxane (HMBEMOPTS) was synthesized with EAMO and 1,1,3,3,5,5-hexamethyltrisiloxane (HMTS). HMBEMOPTS is a novel UV-curable oligomer. The test of photo-DSC shows the photosensitivity of HMBEMOPTS is better than the ordinary oxetane, 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane. HMBEMOPTS was mixed with bisphenol A type epoxy resin E-51 to prepare a cationic UV-curable system, and triarylsulfonium hexafluoroantimonate (UV-6976) was used as a cationic photoinitiator. The mechanical tests of coating films prove that when the mass fraction of HMBEMOPTS is 50%, the mechanical properties of the curing system are the best. The impact strength of the UV-curable films is measured to be 40 kg-cm and the flexibility is 2 mm; the tensile strength and flexural strength of the prepared specimens are 20.74 MPa and 13.43 MPa, respectively. The experimental results show that HMBEMOPTS can effectively improve photosensitivity and flexibility of the photosensitive resin.

以碳酸二乙酯和三羟基丙烷为原料合成了化合物3-乙基-3-羟甲基氧杂环丁烷（EHO），以EHO和烯丙基溴合成了3-乙基-3-烯丙基甲氧基氧杂环丁烷（EAMO），1,1,3 ,3,5,5-六甲基-1,5-双[(3-乙基-3-甲氧基氧杂环丁烷)丙基]三硅氧烷(HMMBEMOPTS)是用EAMO和1,1,3,3,5,5-六甲基三硅氧烷(HMTS)合成的）。HMBEMOPTS 是一种新型的紫外线固化低聚物。photo-DSC测试表明，HMBEMOPTS的光敏性优于普通的氧杂环丁烷，3-乙基-3-[(3-乙基氧杂环丁烷-3-基)甲氧基甲基]氧杂环丁烷。HMBEMOPTS与双酚A型环氧树脂E-51混合制备阳离子UV固化体系，六氟锑酸三芳基锍(UV-6976)作为阳离子光引发剂。涂膜力学试验证明，当HMBEMPTS的质量分数为50%时，固化体系的机械性能最好。UV固化薄膜的抗冲击强度为40 kg-cm，柔韧性为2 mm；制备的试样的拉伸强度和弯曲强度分别为20.74 MPa和13.43 MPa。实验结果表明HMEBEMOPTS能有效提高光敏树脂的光敏性和柔韧性。