碱金属基薄膜的原子和分子层沉积,ACS Applied Materials & Interfaces

当前位置： X-MOL 学术 › ACS Appl. Mater. Interfaces › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

碱金属基薄膜的原子和分子层沉积
ACS Applied Materials & Interfaces ( IF 8.3 ) Pub Date : 2021-11-26 , DOI: 10.1021/acsami.1c17519
Milad Madadi ₁ , Juho Heiska ₁ , Jenna Multia ₁ , Maarit Karppinen ₁

Affiliation

原子层沉积（ALD）是微电子领域发展最快的薄膜技术，但它也被认为是新兴能源技术中各种碱金属薄膜的一种有前途的制造策略，其先锋应用是锂离子电池。自2009年含锂薄膜的开创性工作以来，该领域一直在迅速发展，并从锂扩展到其他碱金属。此外，通过将有机分子的分子层沉积（MLD）循环与碱金属前驱体的 ALD 循环相结合，已成功生长基于碱金属的金属有机薄膜。目前的文献已经描述了大约 100 种用于含碱金属材料的 ALD 和 ALD/MLD 工艺。有趣的是，其中一些材料甚至无法通过任何其他合成途径制造。在这篇综述中，我们的目的是通过以下方式介绍该领域的研究现状：(i) 总结迄今为止针对不同碱金属开发的 ALD 和 ALD/MLD 工艺，(ii) 重点介绍所获得的最有趣的薄膜材料(iii) 解决 ALD 和 MLD 在这些材料应用领域的优点和局限性。最后，（iv）对该领域的未来前景和挑战进行了简要展望。

"点击查看英文标题和摘要"

Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films

Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics, but it is also recognized as a promising fabrication strategy for various alkali-metal-based thin films in emerging energy technologies, the spearhead application being the Li-ion battery. Since the pioneering work in 2009 for Li-containing thin films, the field has been rapidly growing and also widened from lithium to other alkali metals. Moreover, alkali-metal-based metal–organic thin films have been successfully grown by combining molecular layer deposition (MLD) cycles of the organic molecules with the ALD cycles of the alkali metal precursor. The current literature describes already around 100 ALD and ALD/MLD processes for alkali-metal-bearing materials. Interestingly, some of these materials cannot even be made by any other synthesis route. In this review, our intention is to present the current state of research in the field by (i) summarizing the ALD and ALD/MLD processes so far developed for the different alkali metals, (ii) highlighting the most intriguing thin-film materials obtained thereof, and (iii) addressing both the advantages and limitations of ALD and MLD in the application space of these materials. Finally, (iv) a brief outlook for the future perspectives and challenges of the field is given.

更新日期：2021-12-08

点击分享查看原文

点击收藏

公开下载

阅读更多本刊新发论文本刊介绍/投稿指南