Single-Atom Catalysts Designed and Prepared by the Atomic Layer Deposition Technique,ACS Catalysis

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Single-Atom Catalysts Designed and Prepared by the Atomic Layer Deposition Technique
ACS Catalysis ( IF 11.3 ) Pub Date : 2021-06-02 , DOI: 10.1021/acscatal.1c01200
Javier Fonseca ₁ , Junling Lu ₂

Affiliation

The atomic layer deposition (ALD) technique allows the synthesis of materials at the atomic scale to be controlled. ALD has been adapted to design and prepare single-atom catalysts (SACs) with atomic-level control. The major aim of this Review is to systematize our knowledge of the synthesis of SACs by ALD and thus help the reader to extract fundamental principles for the further development of this field. Studies of metal dimers prepared by ALD are also explored. In addition, we describe the fundamental mechanism of ALD, discuss the effects of size, shape, and metal–support interactions for catalysts, and summarize the characterization techniques and preparation methods of SACs. At the end of this Review, we present an outlook of the challenges and opportunities of the synthesis of SACs by ALD.

中文翻译：

原子层沉积技术设计制备的单原子催化剂

原子层沉积 (ALD) 技术允许在原子尺度上控制材料的合成。ALD 已适用于设计和制备具有原子级控制的单原子催化剂 (SAC)。本综述的主要目的是系统化我们对 ALD 合成 SAC 的知识，从而帮助读者提取该领域进一步发展的基本原理。还探索了由 ALD 制备的金属二聚体的研究。此外，我们描述了 ALD 的基本机制，讨论了催化剂的尺寸、形状和金属-载体相互作用的影响，并总结了 SAC 的表征技术和制备方法。在本综述的最后，我们对 ALD 合成 SAC 的挑战和机遇进行了展望。

更新日期：2021-06-18

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