Atomic layer deposition (ALD), which mainly stems from the drive of the semiconductor industry, is a cyclic, multi-step thin film chemical vapor deposition process based on sequential self-limiting surface reactions. It has demonstrated great potential to conduct large-area and low-cost fabrication of various energy storage devices. Besides, a unique high-temperature ALD approach, which is also known as surface-reaction limited pulsed chemical vapor deposition (SPCVD), is introduced on the synthesis of three-dimensional (3D) branched nanowire (NW) architecture for electrode design. This review article intends to summarize the most recent and representative research regarding the application of ALD in the fabrication of supercapacitors (SCs) and lithium-ion batteries (LIBs). We start the discussion on the ALD of nanostructured electrochemically active electrode materials for SCs with a very large surface area on a different template, including carbon nanotubes, nickel foam, tobacco mosaic virus, etc. The ALD layers for electrode passivation, sacrificing the ALD layer for novel nanostructures, a high-temperature modification for 3D nanoarchitecture SCs electrode. For the fabrication of LIBs, applications of ALD in the deposition of active electrode materials, surface protection layer, and solid electrolyte are reviewed in detail. The perspective view of ALD on this energy storage area is also present in the last part.

原子层沉积（ALD）主要源于半导体工业的发展，是一种基于顺序自限表面反应的循环，多步骤薄膜化学气相沉积工艺。它已显示出进行各种能源存储设备的大面积且低成本制造的巨大潜力。此外，在合成用于电极设计的三维（3D）支化纳米线（NW）结构时，引入了一种独特的高温ALD方法，也称为表面反应受限脉冲化学气相沉积（SPCVD）。这篇综述文章旨在总结有关ALD在超级电容器（SC）和锂离子电池（LIB）的制造中的最新和代表性研究。我们开始讨论在不同模板上具有非常大表面积的SC的纳米结构电化学活性电极材料的ALD，包括碳纳米管，泡沫镍，烟草花叶病毒等。用于电极钝化的ALD层，牺牲了ALD层对于新型纳米结构，是对3D纳米结构SC电极的高温改性。对于LIB的制造，将详细介绍ALD在活性电极材料，表面保护层和固体电解质沉积中的应用。最后一部分中也显示了ALD在该储能区域上的透视图。牺牲用于新型纳米结构的ALD层，这是3D纳米结构SC电极的高温改性。对于LIB的制造，将详细介绍ALD在活性电极材料，表面保护层和固体电解质沉积中的应用。最后一部分中也显示了ALD在该储能区域上的透视图。牺牲了用于新型纳米结构的ALD层，这是3D纳米结构SC电极的高温改性。对于LIB的制造，将详细介绍ALD在活性电极材料，表面保护层和固体电解质沉积中的应用。最后一部分中也显示了ALD在该储能区域上的透视图。