Applied Surface Science ( IF 6.3 ) Pub Date : 2021-03-26 , DOI: 10.1016/j.apsusc.2021.149604 J.T. Guo , X.W. Zhao , G.C. Hu , J.F. Ren , X.B. Yuan
We report the two-dimensional (2D) H-Tl2O/CrI3 van der Waals (vdW) heterostructure as a promising valleytronics materials, and investigate the manipulation of valley polarization and valley spin splitting of it by using the first principle calculations. The H-Tl2O/CrI3 heterostructure displays the valley polarization in both the conduction and valence band at two valleys. Especially, the valley polarization can be reached to 14.95 meV at the conduction band. Also, a large valley spin splitting of 0.57 (0.58) eV at the K (K') points are shown in the conduction band. With the manipulation of the interlayer spacing and the in-plane biaxial strain, both the valley polarization and the valley spin splitting for the H-Tl2O/CrI3 heterostructure follow the short-range effects of interfacial orbital hybridization, thus a nearly linear relationship is shown. Our work not only provides the application prospects of the H-Tl2O/CrI3 heterostructure nanodevices, but also gives theoretical effective support for further development of valleytronics.
中文翻译:
二维H-Tl 2 O / CrI 3异质结构中波谷极化的观察和处理
我们报告二维(2D)H-Tl 2 O / CrI 3范德华(vdW)异质结构作为一种有前途的山谷电子材料,并利用第一原理计算研究了山谷极化和山谷自旋分裂的操纵。H-Tl2O / CrI 3异质结构在两个波谷的导带和价带中均显示波谷极化。特别是,在导带处,谷底极化可以达到14.95meV。另外,在导带中显示了在K(K')点处的0.57(0.58)eV的大谷自旋分裂。通过控制层间间距和面内双轴应变,H-Tl 2 O / CrI的波谷极化和波谷自旋分裂3异质结构遵循界面轨道杂交的短程效应,因此显示出近乎线性的关系。我们的工作不仅为H-Tl 2 O / CrI 3异质结构纳米器件提供了应用前景,而且为Valleytronics的进一步发展提供了理论上的有效支持。