通过添加光酸产生剂提高了含有邻硝基苄基醚基的光敏聚酰亚胺的光敏性,Journal of Polymer Science

当前位置： X-MOL 学术 › J. Polym. Sci. › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

通过添加光酸产生剂提高了含有邻硝基苄基醚基的光敏聚酰亚胺的光敏性
Journal of Polymer Science ( IF 3.9 ) Pub Date : 2021-01-18 , DOI: 10.1002/pol.20200851
Gwang‐Sik Song _{1,

2} , Youn‐Jung Heo ₁ , Jeong Ju Baek ₁ , Hyosun Lee ₁ , Geun Yeol Bae ₁ , Kyung Ho Choi ₁ , Won‐Gun Koh ₂ , Gyojic Shin ₁

Affiliation

在本文中，光敏聚酰亚胺（PSPIs）与感光性基，ö在2,2'-二羟基二苯甲酮-3,3'，4,4'-四羧酸二酐和含有二胺的乙二醇链（ODA）的基础上成功合成了硝基硝基苄基（Nb）。此外，准备了一系列聚酰亚胺（PI），ODA-1-PI，ODA-3-PI和ODA-5-PI，其中乙二醇链分别为1、3和5，以研究结构之间的关系。和溶解度。有趣的是，拥有大量乙二醇的ODA-5-PI表现出最出色的溶解度。因此，由于ODA-5-PI在有机溶剂和碱性溶液中具有良好的溶解性，因此PSPI可以是聚（1,4-亚苯基氧基-3,6,9,12,15-五氧八辛烷-1,4-亚苯基-2）通过连接作为光敏基团的Nb合成了2'-二[2-硝基苄氧基]二苯甲酮-3,3'，4,4'-四羧二酰亚胺），称为ODA-5-PSPI。为了产生正色调图案，将合成的ODA-5-PSPI暴露于紫外线辐射下，然后进行曝光后烘烤。之后，使用2.38重量％的四甲基氢氧化铵溶液显影。此外，为了微图案化工艺，还加入了光酸产生剂（PAG）。值得注意的是，在存在PAG的情况下，ODA-5-PSPI的光裂解不仅通过Nb的分子内重排发生，而且还通过其水解反应发生。结果，由于光裂解的协同作用，可以用更少的能量（2.0 J / cm）清楚地获得ODA-5-PSPI和PAG的微图案。另外还加入了光酸产生剂（PAG）用于微图案化工艺。值得注意的是，在存在PAG的情况下，ODA-5-PSPI的光裂解不仅通过Nb的分子内重排发生，而且还通过其水解反应发生。结果，由于光裂解的协同作用，可以用更少的能量（2.0 J / cm）清楚地获得ODA-5-PSPI和PAG的微图案。另外还加入了光酸产生剂（PAG）用于微图案化工艺。值得注意的是，在存在PAG的情况下，ODA-5-PSPI的光裂解不仅通过Nb的分子内重排发生，而且还通过其水解反应发生。结果，由于光裂解的协同作用，可以用更少的能量（2.0 J / cm）清楚地获得ODA-5-PSPI和PAG的微图案。²）与没有PAG的情况（3.6 J / cm ²）进行比较。因此，通过添加PAG，光敏性提高了45％。

"点击查看英文标题和摘要"

The improved photosensitivity of photosensitive polyimides containing o‐nitrobenzyl ether groups induced by the addition of photoacid generator

In this article, photosensitive polyimides (PSPIs) with photosensitive groups, o‐nitrobenzyl ether groups (Nb), were successfully synthesized based on 2,2′‐dihydroxy benzophenone‐3,3′,4,4′‐tetracarboxylic dianhydride and on diamine containing ethylene glycol chains (ODA). Also, a series of polyimide (PI), ODA‐1‐PI, ODA‐3‐PI, and ODA‐5‐PI with a number of ethylene glycol chains of 1, 3, and 5 were prepared to investigate the relationship between structure and solubility. Interestingly, ODA‐5‐PI, which possesses a large number of ethylene glycols, exhibited the most excellent solubility. Therefore, due to the good solubility of ODA‐5‐PI in organic solvents and alkaline solutions, a PSPI, poly(1,4‐phenyleneoxy‐3,6,9,12,15‐pentaoxaoctane‐1,4‐phenylene‐2,2′‐di[2‐nitrobenzyloxy]benzophenone‐3,3′,4,4′‐tetracarboxdiimide), named ODA‐5‐PSPI, was synthesized by linking Nb, which is a photosensitive group. Aiming at producing positive tone patterns, the synthesized ODA‐5‐PSPI was exposed to UV irradiation and then to a post‐exposure bake. Afterward, it was developed using a 2.38 wt% tetramethylammonium hydroxide solution. Furthermore, a photoacid generator (PAG) was additionally incorporated for a micropatterning process. Notably, in the presence of the PAG, the photocleavage of ODA‐5‐PSPI occurred not only by the intramolecular rearrangement of Nb but also by its hydrolysis reaction. As a result, due to the synergistic effect of photocleavage, the micropatterning of ODA‐5‐PSPI with PAG could be clearly obtained with less energy (2.0 J/cm²) compared with that without PAG (3.6 J/cm²). Therefore, through the addition of PAG, the photosensitivity was improved by 45%.

更新日期：2021-02-15

点击分享查看原文

点击收藏

阅读更多本刊新发论文