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High-Performance Two-Dimensional Perovskite Ca2Nb3O10 UV Photodetectors
Nano Letters ( IF 9.6 ) Pub Date : 2020-12-18 , DOI: 10.1021/acs.nanolett.0c03759 Yong Zhang 1 , Siyuan Li 1 , Ziliang Li 1 , Hui Liu 1 , Xinya Liu 1 , Jiaxin Chen 1 , Xiaosheng Fang 1
Nano Letters ( IF 9.6 ) Pub Date : 2020-12-18 , DOI: 10.1021/acs.nanolett.0c03759 Yong Zhang 1 , Siyuan Li 1 , Ziliang Li 1 , Hui Liu 1 , Xinya Liu 1 , Jiaxin Chen 1 , Xiaosheng Fang 1
Affiliation
We first report two-dimensional (2D) perovskite Ca2Nb3O10 ultraviolet photodetectors (UV PDs), which are prepared via a facile calcination-exfoliation method. The 2D Ca2Nb3O10 PDs demonstrate high performance at 3 V at 280 nm, high responsivity (14.94 A W–1), high detectivity (8.7 × 1013 Jones), high spectral selectivity (R280/R400 = 8.84 × 103), fast speed (0.08/5.6 ms), and long-term stability, exceeding those of most reported UV PDs. Furthermore, the Ca2Nb3O10 PDs integrated with poly(ethylene terephthalate) (PET) show excellent flexibility and have high linear dynamic range (96 dB). Our work provides a general strategy for searching new UV PDs based on numerous layered niobates. The Ca2Nb3O10 nanosheets may be one of the optimum semiconductor materials for next-generation high-performance UV PDs.
中文翻译:
高性能二维钙钛矿Ca 2 Nb 3 O 10紫外光电探测器
我们首先报告二维(2D)钙钛矿Ca 2 Nb 3 O 10紫外线光电探测器(UV PDs),这是通过一种简便的煅烧-剥落方法制备的。二维Ca 2 Nb 3 O 10 PD表现出在280 nm的3 V下具有高性能,高响应度(14.94 AW –1),高检测率(8.7×10 13 Jones),高光谱选择性(R 280 / R 400 = 8.84× 10 3),更快的速度(0.08 / 5.6 ms)和长期稳定性,超过了大多数报告的UV PD。此外,Ca 2 Nb 3 O 10与聚对苯二甲酸乙二酯(PET)集成的PD表现出出色的柔韧性,并具有高线性动态范围(96 dB)。我们的工作提供了基于大量分层铌酸盐搜索新的UV PD的一般策略。Ca 2 Nb 3 O 10纳米片可能是下一代高性能UV PD的最佳半导体材料之一。
更新日期:2021-01-13
中文翻译:
高性能二维钙钛矿Ca 2 Nb 3 O 10紫外光电探测器
我们首先报告二维(2D)钙钛矿Ca 2 Nb 3 O 10紫外线光电探测器(UV PDs),这是通过一种简便的煅烧-剥落方法制备的。二维Ca 2 Nb 3 O 10 PD表现出在280 nm的3 V下具有高性能,高响应度(14.94 AW –1),高检测率(8.7×10 13 Jones),高光谱选择性(R 280 / R 400 = 8.84× 10 3),更快的速度(0.08 / 5.6 ms)和长期稳定性,超过了大多数报告的UV PD。此外,Ca 2 Nb 3 O 10与聚对苯二甲酸乙二酯(PET)集成的PD表现出出色的柔韧性,并具有高线性动态范围(96 dB)。我们的工作提供了基于大量分层铌酸盐搜索新的UV PD的一般策略。Ca 2 Nb 3 O 10纳米片可能是下一代高性能UV PD的最佳半导体材料之一。