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Deposition Penetration Depth and Sticking Probability in Plasma Polymerization of Cyclopropylamine
Applied Surface Science ( IF 6.3 ) Pub Date : 2021-02-01 , DOI: 10.1016/j.apsusc.2020.147979
Miroslav Michlíček , Lucie Blahová , Eva Dvořáková , David Nečas , Lenka Zajíčková

Abstract Understanding the role of substrate geometry is vital for a successful optimization of low-pressure plasma polymerization on non-planar substrates used in bioapplications, such as porous materials or well plates. We investigated the altered transport of film-forming species and properties of the coatings for a cyclopropylamine and argon discharge using a combined analysis of the plasma polymer deposition on flat Si pieces, culture wells, microtrenches, a macrocavity, porous hydroxyapatite scaffolds and electrospun polycaprolactone nanofibrous mats. The aspect ratio of the well structures impacted mainly the deposition rate, whereas the film chemistry was affected only moderately. A large deposition penetration depth into the porous media indicated a relatively low sticking probability of film-forming species. A detailed analysis of microtrench step coverage and macrocavity deposition disproved the model of film-forming species with a single overall sticking probability. At least two populations with two different sticking probabilities were required to fit the experimental data. A majority of the film-forming species (76%) has a large sticking probability of 0.20 ± 0.01 , while still a significant part (24%) has a relatively small sticking probability of 0.0015 ± 0.0002 . The presented methodology is widely applicable for understanding the details of plasma-surface interaction and successful applications of plasma polymerization onto complex substrates.

中文翻译:

环丙胺等离子体聚合中的沉积渗透深度和粘附概率

摘要 了解基材几何形状的作用对于在生物应用中使用的非平面基材(例如多孔材料或孔板)上成功优化低压等离子体聚合至关重要。我们使用对扁平硅片、培养井、微沟槽、大腔、多孔羟基磷灰石支架和电纺聚己内酯纳米纤维上的等离子体聚合物沉积的综合分析,研究了成膜物质的传输改变和环丙胺和氩气放电涂层的性质。垫子。井结构的纵横比主要影响沉积速率,而膜化学仅受到适度影响。进入多孔介质的大沉积渗透深度表明成膜物质的粘附概率相对较低。对微沟槽阶梯覆盖和大腔沉积的详细分析推翻了具有单一整体粘附概率的成膜物种模型。至少需要两个具有两种不同粘附概率的群体来拟合实验数据。大多数成膜物质 (76%) 具有 0.20 ± 0.01 的大粘附概率,而仍然有显着部分 (24%) 具有相对较小的粘附概率 0.0015 ± 0.0002。所提出的方法广泛适用于了解等离子体表面相互作用的细节以及等离子体聚合在复杂基材上的成功应用。至少需要两个具有两种不同粘附概率的群体来拟合实验数据。大多数成膜物质 (76%) 具有 0.20 ± 0.01 的大粘附概率,而仍然有显着部分 (24%) 具有相对较小的粘附概率 0.0015 ± 0.0002。所提出的方法广泛适用于了解等离子体表面相互作用的细节以及等离子体聚合在复杂基材上的成功应用。至少需要两个具有两种不同粘附概率的群体来拟合实验数据。大多数成膜物质 (76%) 具有 0.20 ± 0.01 的大粘附概率,而仍然有显着部分 (24%) 具有相对较小的粘附概率 0.0015 ± 0.0002。所提出的方法广泛适用于了解等离子体表面相互作用的细节以及等离子体聚合在复杂基材上的成功应用。
更新日期:2021-02-01
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