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3D-Printed Photoactive Semiconducting Nanowire–Polymer Composites for Light Sensors
ACS Applied Energy Materials ( IF 5.4 ) Pub Date : 2019-12-26 00:00:00 , DOI: 10.1021/acsanm.9b01763 Xin Shan , Pengsu Mao , Haoran Li , Thomas Geske , Divya Bahadur , Yan Xin , Subramanian Ramakrishnan , Zhibin Yu
ACS Applied Energy Materials ( IF 5.4 ) Pub Date : 2019-12-26 00:00:00 , DOI: 10.1021/acsanm.9b01763 Xin Shan , Pengsu Mao , Haoran Li , Thomas Geske , Divya Bahadur , Yan Xin , Subramanian Ramakrishnan , Zhibin Yu
We demonstrated 3D-printed photoactive composites for light sensors. The composites consist of semiconducting polymer nanowires dispersed in an insulating polymer matrix through a thermo- or photocuring process. The nanowires formed percolated networks for charge-carrier collection at a very low nanowire volume concentration. Photodetectors had been fabricated with such composites and obtained a low leakage current density of 25 nA cm–2, a large conductivity change of 18025 times upon light irradiation (1 sun), and a high specific detectivity of 4.5 × 1010 Jones. The composite precursors before curing had been used as paints on different surfaces including wood, cardboard, and glass fiber cloth to create photoactive coatings on these surfaces. The precursors had also been used for 3D printing to create photoactive structures with a mechanical modulus of 4 GPa and an ultimate strength of 36 MPa.
中文翻译:
用于光传感器的3D打印光敏半导体纳米线-聚合物复合材料
我们展示了用于光传感器的3D打印光敏复合材料。该复合材料由通过热固化或光固化过程分散在绝缘聚合物基体中的半导体聚合物纳米线组成。纳米线形成了渗滤网络,用于以非常低的纳米线体积浓度收集电荷载流子。用这种复合材料制造的光电探测器具有25 nA cm –2的低泄漏电流密度,光照射(1个太阳)时电导率变化为18025倍的大值以及4.5×10 10的高比探测率琼斯 固化前的复合材料前体已被用作包括木材,纸板和玻璃纤维布在内的不同表面上的涂料,以在这些表面上形成光敏涂层。该前体也已用于3D打印,以创建具有4 GPa的机械模量和36 MPa的极限强度的光敏结构。
更新日期:2019-12-26
中文翻译:
用于光传感器的3D打印光敏半导体纳米线-聚合物复合材料
我们展示了用于光传感器的3D打印光敏复合材料。该复合材料由通过热固化或光固化过程分散在绝缘聚合物基体中的半导体聚合物纳米线组成。纳米线形成了渗滤网络,用于以非常低的纳米线体积浓度收集电荷载流子。用这种复合材料制造的光电探测器具有25 nA cm –2的低泄漏电流密度,光照射(1个太阳)时电导率变化为18025倍的大值以及4.5×10 10的高比探测率琼斯 固化前的复合材料前体已被用作包括木材,纸板和玻璃纤维布在内的不同表面上的涂料,以在这些表面上形成光敏涂层。该前体也已用于3D打印,以创建具有4 GPa的机械模量和36 MPa的极限强度的光敏结构。